Nanoimprint Template Step Structure for Light Leakage Suppression
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Solution Overview
Problem
In nanoimprint lithography, the existing methods face challenges in suppressing unintended curing of resins due to exposure light leakage, particularly with mesa-shaped step structures, where uniform application of light shielding members is difficult, leading to exposure light leakage and unintended curing.
Innovation Solution
A template for nanoimprint lithography is designed with a first step structure, a second step structure on top of the first, and a light shielding film covering the outer side region of the second step structure. This configuration ensures that the light shielding film is closer to the transfer pattern region, effectively reducing exposure light leakage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a light shielding member is provided on the non-pattern part of the template to suppress unintended curing of resin, then the reliability of the imprinting process is improved, but the manufacturing precision deteriorates because it is difficult to uniformly provide the light shielding member on the side surface of the mesa-shaped step structure
Solution Approach 1:
The patent transitions from a single-step mesa structure to a two-step structure with different height levels. The first step structure provides a lower level for light shielding, while the second step structure provides an upper level for the transfer pattern. This dimensional change allows the light shielding film to be positioned on a horizontal surface at a lower height, making uniform application feasible and preventing light leakage from the side surfaces.
Solution Approach 2:
The template structure is segmented into two distinct step structures with different heights. The first step structure (lower level) is dedicated to light shielding functionality, while the second step structure (upper level) is dedicated to the transfer pattern. This segmentation separates the light shielding function from the pattern transfer function, allowing each to be optimized independently.
2Ease of operation
If the step difference of the mesa-shaped step structure is increased to facilitate releasing, then the ease of operation is improved, but the device complexity increases due to the need for multiple step structures
Solution Approach 1:
The template is segmented into two step structures with different heights. The first step structure (lower level) provides a step difference of about 30 μm that facilitates releasing by creating a gap between the template and resin. The second step structure (upper level) maintains the required height for the transfer pattern. This segmentation allows both releasing facilitation and pattern precision to be achieved simultaneously.
Solution Approach 2:
The patent uses vertical dimensionality with two different height levels to solve both problems. The lower first step structure provides the step difference needed for easy releasing, while the upper second step structure maintains the precise height for the transfer pattern. This multi-level vertical arrangement resolves the contradiction between ease of operation and device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed template design effectively suppresses exposure light leakage, preventing unintended curing of resins during the imprinting process while maintaining the required height of the transfer pattern region.
Implementation Method 1
a light shielding film on an upper surface of the first step structure
Implementation Method 2
a photo imprinting method of curing a resin by light exposure
Data Source
AI summary
A template to be used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate includes a first step structure on a main surface of a base, a second step structure on the first step structure, and at an upper surface of the second step structure, a first concave and convex structure body configuring the transfer pattern, and a second concave and convex structure body configuring an alignment mark. An outer side region of the second step structure at an upper surface of the first step structure is covered with a light shielding film. A high contrast film configured by a film of a different material from a material configuring the base, is on the light shielding film and on a bottom surface of a concave part in the second concave and convex structure body.