Sub-pixel DSM Movement for Nanoimprint Curing Resolution
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Solution Overview
Problem
Current nanoimprint lithography techniques face challenges in achieving precise curing resolution at mesa edges due to the statistical nature of optical beams and limitations in optics design, resulting in inadequate curing resolution of 65 μm per pixel, which is insufficient for preventing extrusion formation.
Innovation Solution
A frame cure apparatus comprising a position actuator and a controller attached to a digital spatial modulator (DSM) with spatial elements, allowing for movement with a step size less than the pitch to create specific curing patterns, ensuring a first curing region exceeds the threshold while a second region does not, thereby achieving precise curing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If DMD is used for selective curing at mesa edges, then curing precision is improved, but the curing resolution is limited to 65 μm per pixel which is insufficient
Solution Approach 1:
The patent divides the curing process into multiple sequential frame exposures instead of using a single DMD pixel pattern. By segmenting the curing dose delivery across multiple frames with sub-pixel positioning, the system achieves effective resolution beyond the physical DMD pixel pitch limitation of 65 μm.
Solution Approach 2:
The patent introduces temporal dimension by using multiple frame exposures over time, and spatial dimension by implementing sub-pixel positioning capabilities. This transforms the single-dimensional pixel-based curing into a multi-dimensional approach where cumulative dosing across frames and positions achieves super-resolution curing.
2Manufacturing precision
If multiple curing patterns are used to achieve fine resolution, then curing resolution is improved, but the complexity of control increases
Solution Approach 1:
The patent implements dynamic control where the DSM position is adjusted with sub-pixel precision across multiple frames. The system dynamically positions the spatial modulator and controls the timing/duration of each frame exposure to accumulate precise dosing patterns, enabling fine resolution control through dynamic rather than static means.
Solution Approach 2:
The patent employs feedback control mechanisms to manage the multiple curing patterns. The controller coordinates the sequential frame exposures, positions the DSM accurately for each frame, and manages the cumulative dosing to ensure the target region receives sufficient total dose while controlling overall process complexity through systematic feedback loops.
3Manufacturing precision
If the DSM is moved with step size less than pitch, then curing resolution is enhanced to 15 times smaller, but the position control precision requirements increase
Solution Approach 1:
The patent performs preliminary positioning of the DSM to sub-pixel precision before each frame exposure. By pre-positioning the spatial modulator accurately and maintaining this position during exposure, the system ensures that the cumulative dosing across frames achieves the desired sub-65 μm resolution without requiring continuous high-precision adjustment during the curing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances curing resolution to 15 times smaller than current methods, enabling precise curing along edges and preventing extrusion formation, thereby improving the accuracy and efficiency of nanoimprint lithography.
Implementation Method 1
curing a photo-curable material in a desired curing region on a substrate
Data Source
AI summary
A frame cure apparatus includes a position actuator and a controller. The position actuator is attached to a digital spatial modulator (DSM) having a plurality of spatial elements with a pitch, and configured to move the DSM with a step size less than the pixel pitch to provide a pattern for curing a photo-curable material in a desired curing region on a substrate. The controller moves the DSM with the step size in a predefined sequence that covers a first curing region and a second curing region such that a first curing dose accumulated at the first curing region exceeds a curing threshold while a second curing dose accumulated at the second curing region does not exceed the curing threshold. The predefined sequence provides the set of curing patterns. The first curing region matches the desired region. The second curing region does not match the desired curing region.