Dual End Effector Vacuum Robot for Variable Pitch Access
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Solution Overview
Problem
Existing robot apparatuses in semiconductor manufacturing are limited in throughput and flexibility, as they can only access one process chamber or load lock chamber at a time, restricting their ability to handle multiple substrates simultaneously and adapt to varying pitches between processing chambers or load lock chambers.
Innovation Solution
A robot apparatus with dual end effectors that can rotate independently about additional axes to accommodate different pitches, allowing concurrent access to multiple load lock or process chambers in dual substrate handling mode, and flexible operation in single substrate handling mode, enhancing throughput and adaptability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a robot apparatus uses a fixed single end effector configuration, then the device complexity is reduced, but the adaptability to different chamber pitches and simultaneous multi-chamber access capability deteriorates
Solution Approach 1:
The robot apparatus employs dynamically adjustable end effector spacing through variable pitch mechanisms, allowing the distance between end effectors to change based on the specific chamber configuration. This dynamic adjustment capability enables the same robot to access chambers with different pitches without requiring multiple fixed configurations, thereby improving adaptability while maintaining reasonable device complexity through controlled variability.
Solution Approach 2:
The robot apparatus is designed with multiple end effectors that can be independently positioned and controlled, enabling a single device to perform multiple functions: accessing single chambers, accessing multiple chambers simultaneously, and adapting to various pitch configurations. This multi-functionality allows the robot to handle diverse substrate processing scenarios without requiring separate specialized systems for each configuration.
2Productivity
If a robot apparatus is designed for single substrate handling, then the device complexity is reduced, but the productivity through simultaneous multi-chamber access deteriorates
Solution Approach 1:
The robot apparatus merges multiple substrate handling capabilities into a single integrated system. By combining multiple end effectors on one robot apparatus, the system can simultaneously handle multiple substrates and access multiple chambers at the same time, thereby increasing throughput. The merged system coordinates the multiple end effectors through a unified control mechanism, achieving high productivity without proportionally increasing device complexity.
Solution Approach 2:
The robot apparatus enables continuous substrate processing by allowing simultaneous access to multiple chambers. While one end effector is loading a substrate into a process chamber, another end effector can simultaneously load a different chamber, eliminating idle time and maintaining continuous productive action. This continuity of useful action across multiple parallel operations significantly increases overall throughput.
3Adaptability or versatility
If a robot apparatus uses fixed end effector positioning, then the ease of operation is improved, but the adaptability to varying pitches between chambers deteriorates
Solution Approach 1:
The robot apparatus incorporates adjustable parameters for end effector positioning, specifically the pitch distance between end effectors. By allowing these parameters to be changed based on the specific chamber configuration, the system adapts to varying pitches. The parameter adjustments are managed through automated control systems that calculate and set the appropriate positions, maintaining ease of operation despite the increased adaptability.
4Productivity
If a robot apparatus accesses chambers sequentially, then the device complexity is reduced, but the loss of time through inability to parallel processing deteriorates
Solution Approach 1:
The robot apparatus eliminates idle time by enabling parallel chamber access. Multiple end effectors operate simultaneously to load and unload different chambers at the same time, ensuring that the robot is continuously productive. This parallel operation converts sequential single-chamber access into simultaneous multi-chamber access, dramatically reducing the total time required for substrate processing cycles.
Data Source
AI summary
Methods, systems, and devices including a robot apparatus with at least one lower arm configured to rotate about a first rotational axis and at least one upper arm rotatably coupled to the at least one lower arm at a second rotational axis that is spaced away from the first rotational axis. The robot apparatus further include a first end effector coupled to the upper arm. The robot apparatus further includes a second end effector coupled to the at least one upper arm. The robot apparatus is suitable for accommodating varying pitches between two adjacent processing chambers or between two adjacent load lock chambers. The robot apparatus may operate in dual substrate handling mode, single substrate handling mode, or a combination thereof. The robot apparatus may also be an off-axis robot.