Dual-Hardness Rubber Membrane for Uniform CMP Polishing
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Solution Overview
Problem
Existing elastic membranes in chemical mechanical polishing (CMP) systems face challenges in achieving uniform film-thickness distribution due to variations in rigidity and flexibility, leading to non-uniform polishing rates and potential deformation during the polishing process.
Innovation Solution
The use of an elastic membrane composed of two integrally formed rubber structures with different hardness levels, where the first rubber structure has a higher hardness for rigidity and the second has a lower hardness for flexibility, ensuring appropriate rigidity and flexibility for each portion of the membrane, thereby maintaining uniform pressure distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single rubber material is used for the elastic membrane, then the structure is simple and easy to manufacture, but the rigidity and flexibility are insufficient for different portions of the membrane
Solution Approach 1:
The patent applies local quality by using different rubber materials with different hardness levels in different portions of the elastic membrane. The first rubber material (softer) is used in regions requiring flexibility for expansion, while the second rubber material (harder) is used in regions requiring rigidity to prevent outward inclination. This allows each portion to have the appropriate mechanical properties for its specific function.
Solution Approach 2:
The patent employs composite materials by combining two different rubber materials with different hardness levels into a single elastic membrane structure. This composite approach enables the membrane to simultaneously exhibit both flexible and rigid characteristics in different regions, resolving the contradiction between adaptability and structural simplicity.
2Stability of the object's composition
If the partition wall has high rigidity to prevent outward inclination, then the membrane deformation is reduced, but the flexibility to expand downward when gas is supplied is compromised
Solution Approach 1:
The partition wall is constructed with different rubber materials at different heights: the lower portion uses softer rubber for flexibility and downward expansion, while the upper portion uses harder rubber for rigidity and prevention of outward inclination. This local differentiation allows the partition wall to simultaneously achieve both expansion capability and deformation prevention.
3Manufacturing precision
If the contact portion has high rigidity to prevent twisting and wear, then the polishing uniformity is improved, but the ease of workpiece detachment is reduced
Solution Approach 1:
The contact portion uses different rubber materials with different hardness levels in different regions. The harder rubber provides rigidity for preventing twisting and wear to ensure polishing uniformity, while the softer rubber provides flexibility for easy workpiece detachment. This local differentiation resolves the contradiction between precision and ease of operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design allows for uniform film-thickness distribution and consistent polishing rates across the workpiece, preventing deformation and wear, while eliminating the need for adhesives, thus enhancing the polishing process efficiency.
Implementation Method 1
the first rubber structure has a first hardness, and the second rubber structure has a second hardness lower than the first hardness
Implementation Method 2
the second rubber structure has a second hardness lower than the first hardness
Implementation Method 3
A pressurized gas is supplied into the pressure chamber, and a pressure of the gas is applied to the workpiece via the elastic membrane
Implementation Method 4
the partition wall 132 is required to have flexibility so as to expand downward when the gas is supplied to the pressure chamber C1
Data Source
AI summary
An elastic membrane having a physical property required for each portion of the elastic membrane and capable of uniformly polishing a workpiece is disclosed. The elastic membrane includes: a contact portion having a workpiece pressing surface for pressing a workpiece against a polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber. The contact portion and at least a part of the partition wall are composed of a first rubber structure and a second rubber structure which are integrally formed, the first rubber structure has a first hardness, and the second rubber structure has a second hardness lower than the first hardness, the first rubber structure includes the workpiece pressing surface, and the second rubber structure includes the at least a part of the partition wall.