Dual Plasma Source Layout for Wide-Pressure Optical Gas Analysis
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Solution Overview
Problem
Existing plasma generation systems for optical emission spectrometry require multiple instruments and flange ports to cover large pressure ranges, leading to increased complexity, cost, and spatial requirements.
Innovation Solution
A device with two plasma sources, one for low-pressure ranges up to high vacuum and another for high-pressure ranges up to normal pressure, integrated into a single unit, allowing for stable plasma generation and emission across a wide pressure range with minimal spatial and resource requirements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple plasma-generating instruments are used to cover a wide pressure range, then the measurement capability across different pressure regions is improved, but the device complexity, spatial requirements, and costs increase
Solution Approach 1:
The patent implements a single plasma generation device that can operate across a wide pressure range (10^-8 to 10^2 Pa) by integrating multiple plasma sources (electron cyclotron resonance plasma source for low pressure, inductively coupled plasma source for high pressure) into one system. This multi-functional design eliminates the need for multiple separate instruments, reducing device complexity while maintaining adaptability across different pressure regions for optical emission spectrometry measurements
2Area of stationary object
If multiple plasma sources are integrated into a single device, then the spatial requirements and costs are reduced, but the device complexity increases
Solution Approach 1:
The patent divides the single device into distinct functional modules: a first plasma source region with electron cyclotron resonance plasma source for low-pressure operation, and a second plasma source region with inductively coupled plasma source for high-pressure operation. Each module is independently designed and optimized for its specific pressure range, then integrated into a unified system with shared optical pathways and control systems, reducing overall spatial requirements while managing complexity through modular architecture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device enables efficient and stable plasma generation across a pressure range of over 12 decades, from high vacuum to atmospheric pressure, using a single device with a single connection for gas analysis and optical sensing, reducing complexity and costs.
Implementation Method 1
a first plasma source (1), wherein the first plasma source (1) is arranged in a first discharge chamber (2) and is designed to generate a first plasma (14) in a low-pressure region
Implementation Method 2
a second plasma source (3), wherein the second plasma source (3) is arranged in a second discharge chamber (4) and is designed to generate a second plasma (15) in a high-pressure region
Implementation Method 3
Optical emission spectrometry (OES) is frequently used for the quantitative and qualitative analysis of gaseous samples. This method is based on the fact that excited atoms emit electromagnetic radiation characteristic of the chemical element
Data Source
Figure 1
Figure 2~3
Figure 4~5
AI summary
The present invention relates to a device for plasma generation in a wide pressure range. The device comprises a first plasma source (1) in a first discharge chamber (2) in order to generate a first plasma in a low-pressure range, a second plasma source (3) in a second discharge chamber (4) in order to generate a second plasma in a high-pressure range, a first coupling element (5) for coupling the device to a system, in order to guide gas out of the system, and a second coupling element (6) for coupling the device to an optical sensor (12). The first discharge chamber (2) has a first optical connection with at least one optical lens (7, 8) to the second coupling element (6) and the second discharge chamber (4) has a second optical connection with at least one optical lens (8) to the second coupling element (6). This invention further relates to a system for optical gas analysis or gas detection and corresponding methods for plasma generation and for operating the system.