3D Electron Beam Additive Fabrication Temperature Control
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Solution Overview
Problem
The existing three-dimensional layer-by-layer shaping apparatuses lose energy of the electron beam when using a blanking mechanism to shut it off, leading to inefficient temperature maintenance of the shaping plane, which results in decreased shaping accuracy and contamination risks.
Innovation Solution
The apparatus controls the electron beam's focus and scanning rate without using a blanking mechanism, ensuring that the energy is utilized efficiently to maintain the shaping plane's temperature, preventing excessive heating and contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a blanking mechanism is used to shut off the electron beam, then the electron beam can be turned off when not needed, but energy is lost and the shaping plane temperature cannot be maintained
Solution Approach 1:
The patent converts the previously harmful effect (electron beam energy being wasted when shut off by the blanking mechanism) into a beneficial effect by eliminating the blanking mechanism and allowing the electron beam energy to be utilized for maintaining the shaping plane temperature. The energy that would have been lost is now put to useful purpose.
Solution Approach 2:
The patent removes the blanking mechanism from the system entirely, extracting the problematic component that caused energy loss. By taking out the blanking mechanism, the system no longer wastes electron beam energy and can maintain temperature more efficiently.
2Ease of operation
If a blanking mechanism is used to shut off the electron beam, then beam control is achieved, but contamination risk increases
Solution Approach 1:
The patent removes the blanking mechanism that served as a source of contamination. By extracting this component from the system, the contamination risk associated with it is eliminated while alternative methods of electron beam control are implemented that do not introduce harmful factors.
3Ease of operation
If a blanking mechanism is used to shut off the electron beam, then beam shutdown is possible, but device complexity increases
Solution Approach 1:
The patent eliminates the blanking mechanism and its associated complexity from the system. By removing this component, the device becomes simpler in configuration while electron beam control is achieved through alternative means that reduce overall system complexity.
Solution Approach 2:
The patent combines the electron beam control function with the temperature maintenance function, eliminating the need for separate blanking mechanism components. This merging of functions reduces device complexity while maintaining operational capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach maintains the shaping plane's temperature without energy loss, enhancing shaping accuracy and preventing contamination, while allowing for a compact and contamination-free apparatus configuration.
Implementation Method 1
irradiates the material with an electron beam to melt and solidify it
Implementation Method 2
irradiates the material with an electron beam to melt and solidify it
Data Source
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AI summary
This invention can maintain the temperature of the shaping plane in a three-dimensional layer-by-layer shaping apparatus. A three-dimensional layer-by-layer shaping apparatus includes a material spreader that spreads the material or materials of a three-dimensional layer-by-layer shaped object onto the shaping plane on which the three-dimensional layer-by-layer shaped object is to be shaped; an electron gun that generates an electron beam; at least one deflector that deflects the electron beam so that it scans the shaping plane one- or two-dimensionally; at least one lens that is positioned between the electron gun and the deflector, and focuses the electron beam; a focus controller that controls the focus of the electron beam based on which region is to be scanned by the electron beam; and a controller that controls the deflecting direction of the deflector and the scanning rate.