E-Beam Exposure Timing Using Off-Beam Current Feedback
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Solution Overview
Problem
Existing E-beam exposure methods struggle to accurately measure and correct current fluctuations in real time, leading to inconsistencies in the exposure process and potential errors in mask manufacturing.
Innovation Solution
The proposed E-beam exposure method involves receiving exposure information, determining on and off beams, calculating exposure time, performing the exposure process, measuring the current of off beams, and adjusting the exposure time based on whether the current is within a reference range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If real-time current measurement and correction is implemented, then exposure precision is improved, but device complexity increases
Solution Approach 1:
The patent implements real-time current measurement using a sensor on the aperture plate, continuously monitors beam current fluctuations, and feeds this information back to adjust exposure parameters dynamically, ensuring precise exposure despite current variations
Solution Approach 2:
The patent introduces a current sensor as an intermediary component on the aperture plate that indirectly measures beam current without interfering with the primary exposure process, enabling monitoring while minimizing additional complexity
2Measurement precision
If current measurement is performed using a sensor on the aperture plate, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The aperture plate serves a dual function: its primary role in defining the exposure pattern and an additional role as a mounting platform for the current sensor, allowing the existing structure to support measurement functionality without requiring separate dedicated measurement components
Solution Approach 2:
The aperture plate is designed with multi-functionality, simultaneously performing pattern definition and current measurement tasks, thereby improving measurement precision while avoiding the need for additional dedicated measurement apparatus that would increase device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables precise real-time measurement and correction of current fluctuations, improving the reliability of the E-beam exposure process and resulting in high-quality mask manufacturing.
Implementation Method 1
performing an E-beam exposure process on the E-beam resist layer
Implementation Method 2
E-beam exposure process
Implementation Method 3
measuring a current of the off beams on an aperture plate of the E-beam exposure apparatus
Data Source
AI summary
An E-beam exposure method may include receiving exposure information on a pattern subject to exposure, determining on beams and off beams of an E-beam exposure apparatus, determining an exposure time in an exposure process, performing the exposure process using the E-beam exposure apparatus, measuring a current of the off beams on an aperture plate of the E-beam exposure apparatus, and a first determination of determining whether the current is within a reference range. If the current is not within the reference range in the first determination, the determining the exposure time may be performed and the exposure time may be changed.