Eccentric Aperture Electrode Layer for Multi-Particle Beam Scanning Control
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Solution Overview
Problem
Multi-particle beam columns face challenges in easy control and simultaneous scanning of particle beams, leading to inefficiencies in processing speed and throughput during inspections and microscopy applications.
Innovation Solution
Incorporating an electrode layer with one or more eccentric apertures in a multi-particle beam column, allowing for controlled scanning by positioning these apertures differently from the beam optical axes to prevent overlapping and enable synchronized deflection of particle beams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If conventional electrode layers with centered apertures are used in multi-particle beam columns, then the structure is simple and easy to manufacture, but the control of simultaneous scanning is difficult and complex
Solution Approach 1:
The patent applies asymmetry by positioning the aperture in the electrode layer off-center relative to the optical axis of the particle beam. This asymmetric aperture position creates different path lengths and deflection angles for particles passing through the aperture, enabling independent control of scanning timing for multiple particle beams. The asymmetric geometry allows one beam to be delayed or advanced relative to another, solving the simultaneous scanning control problem without requiring complex additional control mechanisms.
2Productivity
If multiple particle beams are scanned simultaneously onto a sample, then processing throughput is improved, but beam overlapping occurs and reduces measurement precision
Solution Approach 1:
The patent implements periodic action by sequentially scanning multiple particle beams onto different regions of the sample in a time-multiplexed manner. Instead of true simultaneous scanning that causes overlap, the system rapidly alternates between beams with each beam active for a specific time period. The asymmetric aperture ensures that beams are deflected at different times, creating a periodic scanning pattern that maintains high productivity while preventing beam overlap and preserving measurement precision.
3Ease of operation
If particle beams are deflected using conventional centered apertures, then the optical path is simple, but synchronized deflection control is difficult
Solution Approach 1:
The patent applies preliminary action by pre-positioning the asymmetric aperture in the electrode layer to automatically create the desired deflection timing differences between multiple particle beams. The fixed asymmetric geometry is designed in advance to provide the correct path length differences, eliminating the need for complex real-time adjustment mechanisms. This preliminary structural configuration enables synchronized deflection control while maintaining a relatively simple optical path.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for precise control of scanning in multi-particle beam columns, preventing simultaneous scanning onto a sample, thereby enhancing processing speed and throughput, especially when combined with sample movement during inspections and microscopy.
Implementation Method 1
electron lenses configured to be operated by an electrostatic field or a magnetic field
Implementation Method 2
the Einzel lens 140, which is an example of a focusing lens, is used to focus the electron beam by grounding upper and lower electrode layers and applying a negative (−) voltage (in deceleration mode) or applying a positive (+) voltage (in acceleration mode) to a center electrode layer
Implementation Method 3
Synchronized deflecting voltage is applied to the deflector 150 in order to adjust the path of the electron beam and scan the electron beam onto the surface of the sample s at regular cycles
Data Source
AI summary
Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.