ECR Ion Source Magnetic Field Downstream
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Solution Overview
Problem
Existing electron cyclotron resonance ion generator devices are bulky, heavy, and complex in design, with inefficient beam focusing and high-voltage components requiring isolation transformers, leading to electrical breakdowns and beam divergence.
Innovation Solution
The device relocates the magnetic field generation means downstream of the insulating structure, utilizing the leakage field to create both the resonance and focusing magnetic fields, simplifying the design and eliminating the need for high-voltage isolation platforms, and positions the insulating structure upstream of the plasma chamber to reduce length and bulkiness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the magnetic field generation means are placed upstream of the plasma chamber, then the resonance magnetic field is effectively generated, but the device becomes bulky and heavy requiring high-voltage isolation platforms
Solution Approach 1:
The patent inverts the conventional arrangement by placing the magnetic field generation means (solenoid) downstream of the plasma chamber instead of upstream. This inversion eliminates the need for high-voltage isolation platforms since the solenoid operates at ground potential while still effectively generating the resonance magnetic field in the plasma chamber through its leakage field, thereby reducing device weight and complexity
Solution Approach 2:
The insulating structure serves as an intermediary element that electrically isolates the high-voltage plasma chamber from the ground-potential magnetic field generation means. This intermediary allows the magnetic solenoid to be positioned downstream without direct electrical connection to the high-voltage chamber, enabling weight reduction while maintaining functional reliability
2Reliability
If the insulating structure is positioned downstream of the plasma chamber, then electrical isolation is achieved, but the device length and bulkiness increase
Solution Approach 1:
The patent inverts the conventional positioning by placing the insulating structure upstream of the plasma chamber rather than downstream. This upstream positioning allows the insulating structure to support the high-voltage chamber while the magnetic field generation means operate at ground potential downstream, thereby reducing overall device length and bulkiness while maintaining effective electrical isolation
3Adaptability or versatility
If multiple separate systems are used for magnetic field generation and beam focusing, then functional requirements are met, but the device design becomes complex
Solution Approach 1:
The patent applies multi-functionality by using a single magnetic solenoid system positioned downstream that simultaneously serves two functions: generating the leakage magnetic field for electron cyclotron resonance in the plasma chamber and providing the magnetic field for beam focusing in the extraction system. This eliminates the need for separate magnetic field generation and focusing systems, thereby reducing design complexity while meeting all functional requirements
Solution Approach 2:
The patent merges the magnetic field generation function and beam focusing function into a single integrated solenoid system. By combining these functions into one component positioned downstream of the plasma chamber, the device design becomes simpler with fewer separate systems, reducing overall complexity while maintaining the necessary adaptability for both resonance and focusing operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration results in a more compact, lighter, and simpler ion generator with improved beam focusing and reduced electrical complexity, achieving higher brilliance and stability of the ion beam.
Implementation Method 1
means for generating a magnetic field allowing electron cyclotron resonance in the plasma chamber
Implementation Method 2
couple, inside the chamber a high-frequency wave with a magnetic field B, so as to obtain the conditions under which an electronic cyclotron resonance is likely to appear and ionize the atoms present
Data Source
Figure 1
Figure 2
Figure 3~4
AI summary
The invention relates to an electron cyclotron resonance ion source device comprising: a plasma chamber (1) intended to contain a plasma; means (5) for transmitting a high-frequency wave into the chamber; means (4) for generating a magnetic field in the chamber; an accelerating tube (7) comprising an isolating structure (12) and an extraction system (11), the means (4) for generating a magnetic field being entirely located downstream of the isolating structure (12).