Ion Beam Tubes TRIZ Cases

The magnet forms a magnetic field space between cathode portions to guide ion beams away from poles. This configuration reduces erosion and extends maintenance cycles.

Spokes and a hollow post reduce thermal conduction from the repeller disk, increasing operating temperature by over 100°C.

Segmenting the cathode cap resolves the trade-off between sputtering durability and heating energy consumption in plasma generators.

Multi-cusp magnetic field confines plasma in a Penning ion source, increasing atomic ion fraction and neutron yield while reducing power consumption.

Electronic spring adjusters vary faceplate compressive force to tune thermal conductivity, reducing deposition and enhancing ion beam uniformity.

A collision ionization source supply duct with a decreasing inner height increases gas pressure in the ionization region by reducing flow resistance.

A reflector electrode redirects electrons back into the ionization region, increasing ion production for well logging instruments.

Arranging discharge needles on opposing walls creates uniform ion concentration, resolving uneven distribution from single-sided designs.

Grounded resistive elements at cover openings suppress ion retention, restoring static elimination capacity.

A raised lip on the ion source liner prevents particulate contaminants from entering the annular gap, avoiding electrical shorts caused by debris accumulation.

Connecting the cathode to grounded chamber walls eliminates positive ion attraction, preventing sputtering and electrical shorts while extending component life.

The device eliminates air gaps between the metal tube and extraction means using a ceramic insulator, reducing Penning discharge risks and electrical breakdowns.

Dielectric liquid surrounds the plasma chamber to provide thermal conduction and electrical insulation for the charged particle beam system.

Separating solid packed container from vacuum partition reduces heat capacity and stabilizes sublimation temperature faster.

Laser-driven ion acceleration creates uniform Bragg peaks, minimizing healthy cell damage during deep tumor treatment.

An ion beam source integrates internal gas supply ports within the electrode to generate plasma ions along a closed magnetic loop.

Magnetic field sources align parallel to an ionization chamber axis to confine electron beams and generate uniform ion density profiles.

A dual material repeller with a tungsten head reduces material build-up and extends cathode lifetime.

Independent lens voltage compensates for beam current changes, maintaining focus across a wide operation range.

A pulsed potential on the extractor electrode resolves the contradiction between ion productivity and power consumption in well logging.

An inductively coupled plasma ion source combined with a mass filter selects specific ion species from mixed gas plasma.

Relocating magnetic field generation downstream of the insulating structure reduces device weight and eliminates high-voltage isolation platforms.

A multi-channel ion source uses deflection plates to direct an electron beam into specific gas chambers, enabling rapid selection of distinct ion species.

Single-slot tubular cathode directs feed gases into cold plasma region, preventing fragmentation and increasing molecular ion beam currents.

Conductive grid structure stabilizes plasma formation, resolving material sensitivity issues in negative ion generators.

A pulsed ion beam source extracts ions via a grid and power supply to sputter non-conductive targets.

Plasma chamber uses RF biased electrodes to modulate ion density near the extraction aperture.

Mixing a single impurity substance with a compound containing that element in a vapor generating chamber increases beam current and extends generator lifetime.

Opposed conductive paths in a discharge device cancel electromagnetic noise, reducing interference by 20 dB while maintaining compact size.

Alternating hollow cathodes eliminate external electrodes and neutralizers, reducing device complexity while protecting vacuum hardware from contamination.

An ion source device uses an intermediate electrode to segment the extraction path and control potential differences.

Adjustable extractor and suppressor voltages stabilize emission current, eliminating frequent realignment and extending ion source lifespan.

A Penning discharge ion gun adjusts gas flow to narrow the beam profile.

A tetrode extraction apparatus uses ground-suppression-ground electrodes to enhance ion beam transport through mass analyzers.

A compact ion beam manipulator uses a delta robot-style mechanism with universal joints to reposition electrodes.

A focused ion beam device uses a dual mode gas field ion source to generate multiple ion beams by switching emitter tip temperatures.

A static dielectric fluid isolates the plasma chamber from grounded parts, preventing gas phase discharge while heat pipes manage thermal load.

A tailored extraction aperture modifies the ion beam profile to achieve uniform beam current distribution.

Rapid gas switching maintains high resolution observation while reducing sample damage from helium ions.

Placing the non-evaporable getter on the extraction electrode eliminates dedicated heaters, reducing gas emission and stabilizing the electron source.

Segmented movable blockers equalize ion angular distributions from distinct slits, maintaining processing throughput at low rf power.

A carbon-carbon composite grid plate uses randomly oriented fibers to maintain structural integrity during ion beam extraction.

Segmented permanent magnets enable variable field positioning in a compact ion source, reducing power consumption and size for portable applications.

Segmented through-holes separate alignment from fastening in a grid assembly, reducing misalignment during ion beam etching.

Concentric cylindrical foils reduce thermal loss to extend cathode service life and improve ionization efficiency.

Actuable end plate adjusts plasma volume in RF ion source chamber to improve monoatomic ion fractionation and doping precision.

Segmenting the aperture into an array increases ion current while maintaining spatial uniformity and angular distribution.