Penning Ion Source Multi-Cusp Magnetic Field Atomic Ion Fraction
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Solution Overview
Problem
Penning ion sources have limited maximum neutron yields due to a poor atomic ion fraction, with typically over ninety-percent of extracted ions being molecular, requiring high beam energy and current for suitable neutron yields.
Innovation Solution
The implementation of a Penning ion source apparatus with a multi-cusp magnetic field, gold or platinum coated electrodes, and a field emitter array to increase plasma density and atomic ion fraction, along with an elongated anode geometry to enhance ion beam current density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If conventional Penning ion source design is used, then device simplicity is maintained, but atomic ion fraction remains poor (over 90% molecular ions)
Solution Approach 1:
The magnetic field system is segmented into multiple cusp magnets (typically 8-16 magnets) arranged around the anode, creating a multi-cusp magnetic field configuration. This segmentation allows for improved plasma confinement and enhanced atomic ion fraction while distributing the magnetic field generation across multiple discrete components rather than a single complex magnet system.
Solution Approach 2:
The patent applies local quality by creating regions of different magnetic field strengths and configurations within the ion source chamber. The cusp magnets generate localized magnetic cusps that confine plasma in specific regions, allowing different areas of the chamber to have optimized conditions for atomic ion production while maintaining overall system functionality.
2Productivity
If high beam energy and current are used to compensate for poor atomic ion fraction, then neutron yields can be achieved, but power consumption increases
Solution Approach 1:
The patent changes key plasma parameters including electron temperature, plasma density, and magnetic field strength to optimize atomic ion production. By adjusting these parameters through the multi-cusp magnetic field configuration and electrode design, the system achieves higher atomic ion fractions that enable efficient neutron production at lower beam powers.
Solution Approach 2:
The patent employs composite electrode structures with materials having high secondary electron emission coefficients (such as barium aluminate or strontium aluminate coatings on nickel or stainless steel substrates). This composite approach enhances plasma generation efficiency and atomic ion production, reducing the power required to achieve target neutron yields.
3Productivity
If multi-cusp magnetic field and field emitter array are added, then extracted ion current increases up to eightfold, but device complexity increases
Solution Approach 1:
The patent merges multiple functional components into an integrated system: the multi-cusp magnetic field configuration is combined with field emitter arrays positioned at the cathode, and coordinated with specifically designed electrode geometries. This merging creates synergistic effects where the magnetic field confines plasma, the field emitters generate high-density electron beams, and the electrode geometry optimizes ion extraction, together achieving eightfold increases in extracted ion current.
Solution Approach 2:
The patent introduces additional spatial dimensions to the magnetic field configuration by arranging cusp magnets in a multi-dimensional array around the anode. This three-dimensional magnetic field structure creates multiple plasma confinement regions and enhances ion production pathways that are not accessible with simpler two-dimensional magnetic configurations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration results in a significant increase in extracted ion current, up to eightfold, while maintaining low power consumption, thereby enhancing neutron yields.
Implementation Method 1
The plurality of cusp magnets are configured to generate a multi-cusp magnetic field, with the multi-cusp magnetic field configured to contain a plasma generated in the chamber
Implementation Method 2
the field emitter array is configured to increase a plasma density of a plasma generated in the chamber
Implementation Method 3
the grid is being configured to generate an electric field for electron emission from the field emitter array
Implementation Method 4
The second metal has a higher secondary electron emission coefficient compared to the first metal
Implementation Method 5
Penning ion sources can be used for neutron generation through deuterium-deuterium (D-D) or deuterium-tritium (D-T) fusion reactions
Implementation Method 6
Maximum neutron yields with Penning ion sources are limited by the poor atomic ion fraction characteristic of Penning discharges
Data Source
AI summary
This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.


