Ion Beam Source With Internal Gas Supply and Magnetic Loop
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Solution Overview
Problem
Conventional ion beam sources face issues such as substrate contamination, limited deposition rate at high pressure processes, and complex structures due to external gas supply and polarity changes, which affect the ionization capability and plasma uniformity.
Innovation Solution
An ion beam source with a magnetic field unit forming a closed loop and an electrode unit integrated within, using internal gas for ionization, and adjusting magnetic pole configurations to control ion movement and deposition, while maintaining constant spacing and preventing contamination through internal gas management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If external gas supply and polarity changes are used, then ionization capability is improved, but substrate contamination and device complexity increase
Solution Approach 1:
The patent extracts the gas supply function from external sources and relocates it to internal gas supply ports positioned near the electrode. This eliminates the need for complex external gas supply tubing that penetrates the electrode structure, thereby reducing substrate contamination from external connections while maintaining ionization capability.
Solution Approach 2:
The patent introduces an intermediary internal gas supply system that delivers ionization gas directly to the plasma generation zone without requiring external tubing penetration. This intermediary structure prevents contamination pathways while enabling reliable ionization.
2Quantity of substance
If external gas supply tubing is used, then ionization gas is supplied, but device complexity and contamination risk increase
Solution Approach 1:
The patent merges the gas supply function with the electrode structure itself by integrating internal gas supply ports directly into the electrode body. This combination eliminates separate external tubing systems and reduces overall device complexity while ensuring adequate ionization gas supply.
Solution Approach 2:
The patent implements a nested structure where the gas supply channels are embedded within the electrode structure. The internal gas supply ports are positioned inside or on the electrode surface, creating a compact integrated design that reduces external complexity.
3Stability of the object's composition
If electrode and magnetic pole spacing is reduced, then plasma uniformity is improved, but heat dissipation becomes difficult
Solution Approach 1:
The patent employs hydraulic cooling by circulating cooling water through channels formed within the electrode structure. This allows efficient heat dissipation from the electrode while maintaining close spacing to the magnetic pole, thereby achieving both plasma uniformity and thermal management.
Solution Approach 2:
The patent changes the thermal parameters of the electrode by incorporating internal cooling channels that actively remove heat. This enables the electrode to operate at closer spacing to the magnetic pole for improved plasma uniformity without suffering from excessive heat accumulation.
4Temperature
If cooling water flow is increased, then heat dissipation is improved, but electrode structure complexity increases
Solution Approach 1:
The patent combines the cooling function with the electrode structure by forming cooling water channels directly within the electrode body. This integration achieves effective heat dissipation without requiring separate external cooling systems, thereby limiting the increase in overall structure complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration minimizes contamination, adjusts ion movement, maintains plasma uniformity, increases deposition rates at high pressures, and enables in-situ cleaning, improving the overall performance and efficiency of the ion beam source.
Implementation Method 1
a magnetic field unit including a first side facing a target object to be treated and a second side, where the first side is opened and the second side is closed, and the first side includes a plurality of magnetic pole portions arranged at predetermined intervals with an N-pole and an S-pole alternatively
Implementation Method 2
an electrode unit arranged at a lower end of the closed loop. The ion beam source is configured to rotate the plasma electrons within a process chamber along the closed loop, to generate plasma ions from an internal gas within the process chamber
Implementation Method 3
rotate the plasma electrons within a process chamber along the closed loop, to generate plasma ions from an internal gas within the process chamber
Data Source
AI summary
An ion beam source includes a magnetic field unit including a first side facing a target object to be treated and a second side, where the first side is opened and the second side is closed, and the first side includes a plurality of magnetic pole portions arranged at predetermined intervals with an N-pole and an S-pole alternatively or with same magnetic poles and configured to form a closed loop of plasma electrons and an electrode unit arranged at a lower end of the closed loop. The ion beam source is configured to rotate the plasma electrons within a process chamber along the closed loop, to generate plasma ions from an internal gas within the process chamber, and to provide the plasma ions to the target object.