Ring-Shaped Edge Electrode Groove for Uniform Plasma Processing
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in achieving uniform plasma processing results, require lengthy setup and maintenance, and often necessitate the use of both upper and lower edge electrodes, which can lead to misalignment issues and inefficiencies.
Innovation Solution
A substrate processing apparatus featuring a ring-shaped edge electrode with a groove, a dielectric plate, and a gas supply system that allows for efficient plasma generation and uniform processing using a single edge electrode, reducing setup time and eliminating the need for precise alignment of multiple electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If both upper and lower edge electrodes are used in a bevel etch apparatus, then plasma processing capability is improved, but device complexity and setup time increase due to the need for precise alignment of multiple electrodes
Solution Approach 1:
The patent combines the functions of upper and lower edge electrodes into a single edge electrode structure. This single electrode is positioned to process the edge region of the substrate effectively, eliminating the need for multiple electrodes and their complex alignment requirements while maintaining plasma processing capability
Solution Approach 2:
The single edge electrode is designed to perform multiple functions that were previously distributed between upper and lower electrodes. It can process different regions of the substrate edge and adapt to various processing requirements, reducing the overall number of components needed in the system
2Adaptability or versatility
If both upper and lower edge electrodes are repeatedly moved during processing, then processing flexibility is improved, but manufacturing precision deteriorates due to shifts in relative position and angle between electrodes
Solution Approach 1:
By merging the upper and lower edge electrodes into a single electrode structure, the patent eliminates the relative position and angle shifts that occur when multiple electrodes are repeatedly moved. The single electrode maintains consistent positioning while still providing processing flexibility through controlled movement of the entire electrode-substrate assembly
3Manufacturing precision
If both upper and lower edge electrodes are installed and aligned precisely, then processing uniformity is improved, but loss of time increases due to lengthy setup and maintenance procedures
Solution Approach 1:
The patent reduces setup and maintenance time by consolidating multiple electrodes into a single electrode structure. This eliminates the time-consuming alignment procedures between upper and lower electrodes while maintaining processing uniformity through the single electrode's consistent positioning and controlled movement
Solution Approach 2:
The single edge electrode design reduces maintenance requirements compared to a multi-electrode system. With fewer components to align and maintain, the system requires less intervention for setup and maintenance activities, thereby reducing the loss of time associated with these operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures efficient and uniform substrate processing, reduces setup time, and effectively processes the edge region of substrates using a single edge electrode, minimizing misalignment issues and improving operational efficiency.
Implementation Method 1
an edge electrode provided to surround the substrate supported on the chuck when viewed from above and to generate plasma from the gas
Data Source
AI summary
A substrate processing apparatus is provided. The substrate processing apparatus includes a chuck supporting a substrate, a gas supply unit configured to supply a process gas to an edge region of the substrate supported on the chuck, and an edge electrode provided to surround the substrate supported on the chuck when viewed from above and to generate plasma from the gas, wherein the edge electrode has a ring shape and a groove recessed in a direction from an inner periphery of the edge electrode to an outer periphery of the edge electrode when viewed from above is formed in the edge electrode.