Edge Ring Alignment Structure for Plasma Chamber Maintenance
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in accurately aligning ring members during replacement, leading to inefficiencies and potential damage to the electrostatic chuck and outer edge ring due to misalignment and exposure to plasma, which shortens the maintenance cycle and reduces productivity.
Innovation Solution
A substrate processing apparatus with an inner and outer edge ring configuration, where the outer edge ring has a first alignment portion and is electrostatically attracted, and a lifter mechanism to move the rings up and down, ensuring accurate alignment of the inner edge ring with the outer edge ring using tapered surfaces, preventing ion exposure and wear.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the ring member is replaced without accurate alignment, then the replacement process is simple, but the electrostatic chuck and outer edge ring are damaged by plasma exposure and misalignment wear
Solution Approach 1:
The patent introduces an alignment portion as an intermediary structure between the inner edge ring and outer edge ring. This alignment portion acts as a mediator that guides and ensures accurate positioning during ring replacement, preventing direct contact and damage between misaligned components while maintaining the simplicity of the replacement process
Solution Approach 2:
The alignment portion is pre-formed on the outer edge ring before the replacement operation. This preliminary structural feature ensures that when the inner edge ring is placed, automatic alignment occurs without requiring complex adjustment procedures, thereby protecting the electrostatic chuck and outer edge ring from damage while maintaining operational simplicity
2Manufacturing precision
If the outer edge ring is made larger to improve alignment, then alignment accuracy improves, but the device complexity and plasma exposure risk increase
Solution Approach 1:
Instead of making the entire outer edge ring larger, the patent applies the alignment portion only at the specific local area where alignment is needed. This localized structural feature achieves the required alignment accuracy without increasing the overall size of the outer edge ring or exposing more area to plasma damage
Solution Approach 2:
The outer edge ring is segmented into functional zones: the alignment portion for positioning and the main body for structural support. This segmentation allows the alignment function to be achieved through a small, precise feature rather than enlarging the entire component, thereby maintaining simplicity while improving alignment accuracy
3Ease of operation
If the lifter moves both rings simultaneously, then the operation is simplified, but alignment accuracy decreases
Solution Approach 1:
The alignment portion serves as a mediator that decouples the movement of the two rings. Even when the lifter moves both rings simultaneously, the alignment portion ensures that the inner edge ring is guided into correct position relative to the outer edge ring, maintaining alignment accuracy despite the simplified simultaneous operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise alignment of ring members, prolongs the service life of the outer edge ring and electrostatic chuck, and reduces the frequency of chamber maintenance, thereby enhancing the operational efficiency and productivity of the plasma processing apparatus.
Implementation Method 1
an outer edge ring electrostatic chuck disposed at a position of the support, the position facing the outer edge ring
Data Source
AI summary
There is provided a substrate processing apparatus comprising: a plasma processing chamber; a support accommodated in the plasma processing chamber; an inner edge ring provided around a substrate; an outer edge ring provided around the inner edge ring, the outer edge ring having an inner peripheral portion overlapping an outer peripheral portion of the inner edge ring when viewed from above and having a first alignment portion; an outer edge ring electrostatic chuck disposed at a position of the support, the position facing the outer edge ring; and a lifter configured to move the inner edge ring and/or the outer edge ring up and down. The inner edge ring is configured to be aligned with the outer edge ring by the first alignment portion in a state in which the outer edge ring electrostatic chuck is driven and the outer edge ring is attracted.


