Electron-Beam Doped Carbon Nanomaterial Electrodes for Low Sheet Resistance

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Conventional doping methods for carbon nanomaterials, such as graphene, are complex, time-consuming, and limited in processing large areas, resulting in high sheet resistance and non-uniformity.

Innovation Solution

A method involving electron beam irradiation is used to dope carbon nanomaterials, specifically by irradiating electron beams onto a carbon nanomaterial/polymer structure, which changes the chemical structure of the polymer and increases the carrier concentration of the carbon nanomaterial.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional doping methods (deposition, coating, evaporation) are used to increase carrier density of graphene, then sheet resistance is reduced, but processing time increases and process complexity increases

Engineering Contradiction:

Improvesheet resistanceVSAvoidprocessing time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The patent replaces conventional mechanical/chemical doping methods (deposition, coating, evaporation) with electron beam irradiation. The electron beam directly transfers kinetic energy to graphene atoms, inducing doping without requiring physical contact or chemical reactions. This substitution reduces processing time from minutes/hours to seconds while achieving the same sheet resistance reduction.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the doping mechanism from gradual material deposition to instantaneous energy input via electron beam irradiation. By controlling electron beam parameters (energy, flux, irradiation time), the doping level can be precisely adjusted, achieving rapid sheet resistance reduction with simplified process parameters.

Inventive Principle:

Principle #35Parameter changes

2Reliability

If conventional doping methods are used, then carrier density increases, but doping uniformity decreases due to processing system limitations

Engineering Contradiction:

Improvecarrier densityVSAvoiddoping uniformity

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The electron beam system replaces conventional deposition/coating equipment, eliminating limitations related to source-to-substrate distance, material distribution uniformity, and processing chamber geometry. The electron beam can be scanned or focused to achieve uniform irradiation across large areas, ensuring consistent doping throughout the graphene sheet.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Reliability

If conventional doping methods are used, then sheet resistance is reduced, but the number of processing steps increases

Engineering Contradiction:

Improvesheet resistanceVSAvoidprocessing steps

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The patent combines multiple functions into the electron beam irradiation step: the electron beam simultaneously transfers kinetic energy to dope graphene, heats the substrate to facilitate doping, and can be controlled to affect specific areas. This single step replaces sequential operations of deposition, annealing, and doping that characterize conventional methods.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The electron beam system replaces entire sequences of conventional processing equipment and steps with a single irradiation process, simplifying the manufacturing workflow and reducing the number of processing stations required.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

4Reliability

If conventional doping methods are used, then local area doping is achieved, but large area processing capability is limited

Engineering Contradiction:

Improvedoping uniformityVSAvoidprocessing area

Core Design Contradiction:

ReliabilityVSArea of stationary object

Solution Approach 1:

The electron beam system employs dynamic scanning or sweeping motion across the substrate surface, allowing the beam to cover large areas while maintaining focused energy density. This dynamic approach enables uniform doping over extensive regions without requiring the substrate to be moved through complex processing zones.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method significantly reduces sheet resistance by up to 85% while maintaining high transmission, achieving excellent doping uniformity and stability across large areas, thus enhancing the processability and productivity of carbon nanomaterial-based structures.

Implementation Method 1

irradiating electron beams to the carbon nanomaterial layer

Methodology Applied

Scientific EffectElectron beam irradiation: Electron Beam

Implementation Method 2

the electron beam accelerated to a speed close to the speed of light... transferring kinetic energy

Methodology Applied

Scientific EffectKinetic energy transfer:

Data Source

PatentUS12308142B2Carbon nanomaterial-based structure using electron beam, flexible transparent electrode comprising the same, and method for producing the same

Publication Date: 2025.05.20 KOREA INST OF SCI & TECH

AI summary

Disclosed is a carbon nanomaterial-based structure, including: a polymer resin layer; and a carbon nanomaterial layer stacked on the polymer substrate, wherein the carbon nanomaterial is a carbon nanomaterial doped by electron beams.