Electron Microscope Imaging With Light Interference Feature Extraction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing electron microscopes do not account for the intensity distribution of standing waves generated by light interference, resulting in incomplete sample information being superimposed on images, such as sample shape, dimensions, and material properties.
Innovation Solution
A charged particle beam system that extracts feature amounts from light interference, diffraction, and standing waves patterns to obtain sample information by irradiating the sample with light, using a combination of scanning electron microscopes, laser beam irradiation units, and computer systems to analyze and process image patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of information
If light is irradiated onto the sample in an electron microscope to superimpose optical effects on the image, then additional sample information can be obtained, but the intensity distribution of standing waves generated by light interference is not taken into account, resulting in incomplete sample information
Solution Approach 1:
The system calculates the intensity distribution of standing waves generated by light interference and uses this information to correct or interpret the electron microscope image. The processor incorporates the standing wave intensity distribution as feedback to accurately extract sample information from the superimposed image patterns, resolving the contradiction between obtaining additional information and maintaining measurement precision.
2Loss of information
If light interference and standing wave patterns are used to extract sample information, then comprehensive sample properties can be obtained, but the system complexity increases due to the need for additional light irradiation units and processing components
Solution Approach 1:
The patent combines the light irradiation unit with the existing electron microscope system, merging optical illumination with electron beam imaging. The processor integrates both electron beam image data and optical interference pattern data into a unified analysis framework, obtaining comprehensive sample information while managing system complexity through functional integration.
3Measurement precision
If multiple feature amounts from light interference, diffraction, and standing waves are extracted to obtain comprehensive sample information, then the accuracy of image analysis is enhanced, but the processing complexity and time increase
Solution Approach 1:
The system performs preliminary calculation of the standing wave intensity distribution based on known optical parameters (wavelength, incident angle, sample geometry) before image analysis. This pre-computed intensity distribution is then used as a reference framework during image processing, enabling faster extraction of sample information from the superimposed patterns without requiring iterative or computationally intensive analysis methods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the acquisition of comprehensive sample information, including height, sidewall angle, dielectric constant, and material properties, by analyzing patterns caused by light interference and diffraction, enhancing the accuracy of image analysis in electron microscopes.
Implementation Method 1
a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample
Implementation Method 2
a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample
Implementation Method 3
a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample
Data Source
AI summary
An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).