Electrostatic Chuck Upper Plate Contact Pattern Segmentation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing electrostatic chucks face challenges in efficiently de-chucking substrates without causing damage, often resulting in prolonged de-chucking times and uneven force distribution.

Innovation Solution

The electrostatic chuck design features an upper plate with distinct contact patterns and an outer dam, where the second contact patterns have greater surface roughness and smaller diameter, positioned closer to the outer dam, to enhance chucking efficiency and reduce de-chucking time by distributing force uniformly.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If a conventional electrostatic chuck design is used, then the substrate can be held during processing, but the de-chucking time is prolonged and force distribution is uneven

Engineering Contradiction:

Improvede-chucking timeVSAvoidsubstrate damage risk

Core Design Contradiction:

Loss of timeVSReliability

Solution Approach 1:

The contact pattern structure is segmented into multiple regions with different surface roughness characteristics. The first contact pattern structures have a first surface roughness while the second contact pattern structures have a second surface roughness that is greater than the first, creating zones with different friction coefficients for controlled de-chucking

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Different regions of the contact pattern structure are given different local properties through varying surface roughness. The second contact pattern structures have increased surface roughness compared to the first, creating localized zones that facilitate uniform force distribution and controlled substrate release

Inventive Principle:

Principle #3Local quality

2Manufacturing precision

If the surface roughness of contact patterns is increased, then the chucking force distribution becomes more uniform, but the contact area with the substrate decreases

Engineering Contradiction:

Improveforce distribution uniformityVSAvoidcontact pattern surface area

Core Design Contradiction:

Manufacturing precisionVSArea of stationary object

Solution Approach 1:

The contact pattern structure is divided into multiple segments with different surface roughness values. The first contact pattern structures maintain a lower surface roughness for larger contact area, while the second contact pattern structures have higher surface roughness for enhanced force distribution uniformity

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Different local regions of the contact pattern structure have different surface roughness properties optimized for their specific functions, allowing simultaneous achievement of adequate contact area and uniform force distribution

Inventive Principle:

Principle #3Local quality

3Stability of the object's composition

If the outer dam is positioned closer to the second contact pattern structures, then the chucking stability is improved, but the force distribution becomes more concentrated

Engineering Contradiction:

Improvechucking stabilityVSAvoidforce distribution uniformity

Core Design Contradiction:

Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The contact pattern structure is segmented into first and second contact pattern structures at different distances from the outer dam. This segmentation allows the second contact pattern structures near the outer dam to provide stability while the first contact pattern structures farther away contribute to force distribution uniformity

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The contact pattern structures are asymmetrically positioned relative to the outer dam, with the second contact pattern structures closer to the outer dam than the first contact pattern structures, creating a gradient in force distribution that balances stability and uniformity

Inventive Principle:

Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design reduces the time required for de-chucking and prevents substrate damage by ensuring a uniform reduction in chucking force, improving the de-chucking characteristics of the electrostatic chuck.

Implementation Method 1

The electrostatic chuck may chuck the substrate by electrostatic force.

Methodology Applied

Scientific EffectElectrostatic force: Electrostatics

Implementation Method 2

a surface roughness of a top surface of the second contact pattern structure is greater than a surface roughness of a top surface of the first contact pattern structure

Methodology Applied

Scientific EffectFriction: Friction

Data Source

PatentUS20230187253A1Electrostatic chuck including upper plate and substrate processing apparatus including the same

Publication Date: 2023.06.15 SAMSUNG ELECTRONICS CO LTD

AI summary

An electrostatic chuck according to the disclosure includes a chuck base, and an upper plate. The upper plate includes a base portion, and a first contact pattern, a second contact pattern and an outer dam protruding from the base portion. The outer dam surrounds the first contact pattern structure and the second contact pattern structure. A distance of the second contact pattern structure to the outer dam is less than a distance from the first contact pattern structure to the outer dam. A surface roughness of a top surface of the second contact pattern structure is greater than a surface roughness of a top surface of the first contact pattern structure.