Electrostatic Chuck Particle Repulsion via DC Voltage
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Solution Overview
Problem
Electrostatic chucks in ion implanters face performance issues due to particle deposits when not supporting a workpiece, leading to inconsistent clamping and potential failure, with conventional solutions like frequent cleaning or replacement being time-consuming and costly.
Innovation Solution
An electrostatic chuck with a dielectric layer and electrodes configured to accept a DC voltage signal to repel charged particles when no workpiece is present, limiting deposits on the surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the electrostatic chuck is left in the parked position without workpiece support, then the system can perform beam stability tests and tuning procedures, but particle deposits form on the electrostatic chuck surface leading to performance degradation
Solution Approach 1:
The patent applies preliminary anti-action by generating a repulsive electrostatic field on the electrostatic chuck surface before particle deposits can form. When the chuck is in the parked position without a workpiece, a voltage is applied to create an electrostatic field that repels charged particles, preventing deposit formation in advance and maintaining surface cleanliness for reliable clamping performance
2Ease of repair
If conventional cleaning methods are used to remove particle deposits, then the electrostatic chuck surface can be cleaned, but the fragile material may be damaged and performance may not be restored
Solution Approach 1:
The patent converts the harmful charged particles into a beneficial repulsive force. By applying a voltage to the electrostatic chuck when in the parked position, the system creates an electrostatic field that actively repels charged particles away from the surface. This transforms the potential harm of particle accumulation into a protective mechanism that prevents deposits without requiring physical cleaning that could damage the fragile chuck surface
3Reliability
If the electrostatic chuck is replaced to restore performance, then clamping force consistency can be restored, but great expense and downtime are incurred
Solution Approach 1:
The patent implements preliminary action by continuously maintaining the electrostatic chuck surface in a clean state through proactive particle repulsion. By applying a repulsive voltage when the chuck is parked without a workpiece, the system prevents particle deposits from accumulating in the first place. This eliminates the need for future replacement to restore clamping force consistency, saving both time and expense
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces the need for frequent maintenance, improves clamping performance, and delays or avoids costly replacements by effectively preventing particle deposits on the electrostatic chuck.
Implementation Method 1
The at least one electrode is configured to accept a DC voltage signal to produce a first charge to repel charged particles from the dielectric layer when the dielectric layer is not supporting any workpiece
Data Source
AI summary
An ion implanter includes an electrostatic chuck. The electrostatic chuck is configured to repel charged particles from a surface of the electrostatic chuck to limit deposits of the charged particles on the surface when the electrostatic chuck is not supporting any workpiece. An electrostatic chuck including a dielectric layer and at least one electrode is also provided. The at least one electrode is configured to accept a DC voltage signal to produce a first charge to repel charged particles from the dielectric layer when the dielectric layer is not supporting any workpiece to thereby limit deposits of the charged particles on the dielectric layer.