Electrostatic Multipole Device Aperture Electrode Radial Distance
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Solution Overview
Problem
Existing electrostatic multipole devices face challenges in miniaturization while maintaining high-quality electric fields, which affects the spatial resolution and throughput of charged particle beams in applications like SEM, leading to increased spot size and reduced probe current.
Innovation Solution
The design includes a substrate with aperture openings and electrodes arranged at a radial distance from the beam limiting edge, allowing charged particles to propagate through a central region with high-quality electric fields, ensuring accurate beam correction and deflection without edge region deviations, and utilizing a multilayer substrate with insulator and conductor layers for easy manufacturing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If electrostatic multipole devices are miniaturized, then device size is reduced, but electric field quality deteriorates leading to increased spot size
Solution Approach 1:
The device is segmented into distinct functional regions: a central aperture opening for beam passage and surrounding electrode regions for field generation. This segmentation allows the beam-propagating central region to remain free of disruptive edge fields while the peripheral electrode regions generate the required multipole fields, thus maintaining field quality in a miniaturized configuration.
Solution Approach 2:
Different regions of the device are assigned different functional qualities: the central aperture region provides a clean, undisturbed beam path with high-quality electric fields, while the peripheral electrode regions handle field generation. This local differentiation ensures that the critical beam-influencing region maintains excellent field quality independent of the miniaturized overall device dimensions.
2Volume of moving object
If electrostatic multipole devices are miniaturized, then device size is reduced, but spatial resolution deteriorates
Solution Approach 1:
By segmenting the device into a central aperture region and peripheral electrode regions, the invention isolates the beam propagation path from edge effects. This allows the aperture opening to maintain dimensions and field qualities necessary for high spatial resolution while the overall device can be miniaturized through compact electrode arrangements in the peripheral regions.
3Manufacturing precision
If electrode arrangement is optimized for field quality, then electric field quality improves, but device complexity increases
Solution Approach 1:
The invention merges the aperture structure and electrode mounting structure into a single integrated substrate. The substrate simultaneously provides the aperture opening for beam passage and serves as the mounting platform for the electrodes, eliminating the need for separate alignment and assembly of multiple components. This integration maintains excellent electric field quality while reducing overall device complexity.
Solution Approach 2:
The substrate serves multiple functions: it defines the aperture opening geometry, provides mechanical support for the electrodes, establishes the spatial relationship between aperture and electrodes, and acts as the structural foundation for the entire device. This multi-functionality reduces the number of separate components needed, thereby simplifying the device while maintaining field quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the creation of miniaturized electrostatic multipole devices that maintain excellent electric field quality, improving spatial resolution and beam control, and simplifies manufacturing processes, thereby enhancing the performance of charged particle beam systems.
Implementation Method 1
four or more electrodes which are formed on a first main surface of the substrate for influencing the charged particle beam propagating through the aperture opening
Data Source
AI summary
An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.