Embedded Metal Pad Layout for IR Drop in Stacked Semiconductor Dies

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Solution Overview

Problem

Stacked semiconductor devices experience increased resistance and voltage drop (IR drop) due to limited critical dimensions in power routing, leading to reduced performance, timing delays, and increased power consumption, which are exacerbated by the need for additional circuitry to support increased photodiode density and readout functions.

Innovation Solution

Incorporating a metal pad embedded within the semiconductor substrate to provide an additional current path with reduced resistance, mitigating IR drop by allowing for parallel conductive pathways that bypass the limitations of conventional metal wire dimensions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If conventional metal wire routing is used for power distribution, then the device footprint is reduced and manufacturing is simplified, but resistance increases and voltage drop worsens

Engineering Contradiction:
Improvevoltage dropVSAvoidinterconnect structure
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent transitions from conventional two-dimensional metal wire routing to a three-dimensional embedded metal pad structure. The metal pad is embedded within the semiconductor substrate, creating additional conductive pathways that extend in multiple dimensions, thereby reducing resistance and voltage drop without increasing the device footprint.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The metal pad is nested within the semiconductor substrate, with the conductive material embedded inside the substrate volume. This nesting approach allows the power distribution network to utilize the substrate's internal space, reducing resistance without occupying additional external space or complicating the overall device structure.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Loss of energy

If metal wire dimensions are reduced to increase interconnect density, then area is reduced, but resistance increases and voltage drop worsens

Engineering Contradiction:
Improvevoltage dropVSAvoiddevice footprint
Core Design Contradiction:
Loss of energyVSArea of stationary object

Solution Approach 1:

The embedded metal pad creates conductive pathways that extend vertically and laterally within the substrate, utilizing three-dimensional space. This allows for reduced device footprint while maintaining low resistance through multiple conductive paths that are not constrained by planar wire routing limitations.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Adaptability or versatility

If additional circuitry is added to support increased photodiode density, then functionality is improved, but resistance increases and voltage drop worsens

Engineering Contradiction:
Improvephotodiode density supportVSAvoidvoltage drop
Core Design Contradiction:
Adaptability or versatilityVSLoss of energy

Solution Approach 1:

The metal pad structure is nested within the substrate to provide additional current paths that support higher photodiode density. The embedded configuration allows circuitry to be added for increased functionality while the metal pad simultaneously provides low-resistance power distribution to accommodate the additional circuitry without exacerbating voltage drop.

Inventive Principle:
Principle #7Nested doll (Nesting)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The metal pad reduces voltage drop and maintains or improves interconnect density, enhancing the performance and functionality of stacked semiconductor devices by providing efficient power distribution without increasing manufacturing costs.

Implementation Method 1

Incorporating a metal pad embedded within the semiconductor substrate to provide an additional current path with reduced resistance, mitigating IR drop

Methodology Applied
Scientific EffectElectrical Conduction: Conduction (electrical)

Data Source

PatentUS20250344543A1Stacked semiconductor device with metal pad for reduced voltage drop
Publication Date: 2025.11.06 OMNIVISION TECHNOLOGIES INC
  • US20250344543A1 patent drawing
  • US20250344543A1 patent drawing
  • US20250344543A1 patent drawing

AI summary

A stacked semiconductor device comprising a first die including a first semiconductor substrate and a first interconnect, a second die including a second semiconductor substrate and a second interconnect, a plurality of first bonding pads disposed within the first interconnect stack, a plurality of second bonding pads disposed within the second interconnect stack, and a metal pad embedded within the first semiconductor substrate is described. The plurality of first bonding pads contact the plurality of second bonding pads at a bonding interface to form a plurality of bonding connections. The metal pad is coupled to a first bonding connection included in the plurality of bonding connections. The metal pad extends laterally between a first pair of bonding connections included in the plurality of bonding connections when the stacked semiconductor device is viewed from a plan view.