Multi-Fingered ESD Transistor With Floating Wells

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Solution Overview

Problem

In multi-fingered ESD protection circuits, non-uniform triggering of parasitic bipolar transistors due to varying electric potential under gate fingers leads to inadequate discharge of ESD pulses, and conventional solutions increase transistor size to address this issue.

Innovation Solution

The introduction of elongated floating wells between substrate taps and gate fingers, which isolate substrate taps and force current flow perpendicular to gate fingers, enhancing potential differences and triggering uniformity, allowing for reduced tap distance and transistor size while improving ESD protection performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the distance between substrate tap and gate fingers is increased to enhance potential difference, then ESD protection performance is improved, but transistor size increases substantially

Engineering Contradiction:
ImproveESD protection performanceVSAvoidtransistor size
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The substrate tap is segmented into multiple distributed taps positioned beneath different gate fingers. This segmentation allows each tap to serve a specific gate finger, reducing the distance between taps and gate fingers while maintaining uniform potential distribution across the structure, thereby improving ESD protection without increasing overall transistor size

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The substrate tap is repositioned from a peripheral location to a position directly beneath the gate fingers (vertical dimension change). This dimensional reconfiguration reduces the horizontal distance between the tap and gate fingers, enhancing potential difference and triggering uniformity without expanding the transistor's planar footprint

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If conventional multi-fingered structure is used to increase total gate width, then ESD discharge capability is improved, but non-uniform triggering occurs due to varying potential under different fingers

Engineering Contradiction:
ImproveESD discharge capabilityVSAvoidtriggering uniformity
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

Each gate finger is assigned a dedicated substrate tap positioned directly beneath it, creating localized potential distribution. This ensures that each finger experiences uniform potential conditions, enabling simultaneous and uniform triggering across all fingers while maintaining the multi-fingered structure's high ESD discharge capability

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution achieves more uniform triggering of parasitic bipolar transistors, increasing the ESD pulse discharge capability and reducing transistor size, with improved performance demonstrated by higher triggering voltage, snapback voltage, and increased current handling capacity compared to prior art devices.

Implementation Method 1

N-type tap 292 makes ohmic contact to N-type well 240 through N-type implant region 290

Methodology Applied
Scientific EffectOhmic contact: Conduction (electrical)

Implementation Method 2

the triggering of the parasitic bipolar transistor depends on forward biasing the P-N junction between the P-type substrate and the N-type source region

Methodology Applied
Scientific EffectForward biasing: Diode

Data Source

PatentUS8912605B1ESD protection circuit
Publication Date: 2014.12.16 ALTERA CORP
  • US8912605B1 patent drawing
  • US8912605B1 patent drawing
  • US8912605B1 patent drawing

AI summary

A multi-fingered gate transistor formed in a substrate of one conductivity type overlying a well of a second conductivity type. Ohmic contact to the well is made by an implanted region of the second conductivity type that circumscribes the gate transistor. Ohmic contact to the substrate is made by taps located on sides of the gate structure between the gate structure and the well contact. Floating wells are located on opposite sides of the gate structure between the substrate taps and the ends of the gates to isolate these substrate taps and force current flow in the substrate under the gate transistor to be substantially perpendicular to the direction in which the gate fingers extend. This increases the potential difference between these substrate regions and source regions in the gate transistor, thereby aiding the triggering of the parasitic bipolar transistors under adjacent gate fingers into a high current state.