Ether-Based Resist Protection Film Composition
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Solution Overview
Problem
Conventional resist protection film compositions using alcohol as solvents often damage the resist film, leading to T-top shaped patterns and surface roughness, and are limited by the structure of the polymer used, making it difficult to form high-quality rectangular resist patterns.
Innovation Solution
A composition using an alkali-soluble polymer combined with an ether-based solvent is developed, allowing for the formation of a resist protection film that reduces film damage and enables the creation of good rectangular resist patterns, regardless of the polymer structure, through the use of ether-based solvents which have a smaller solubility parameter than alcohol-based solvents.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If alcohol-based solvents are used in resist protection film composition, then the film can be formed, but the resist film is damaged and pattern quality deteriorates
Solution Approach 1:
The patent changes the solvent type from alcohol-based to ether-based, altering the chemical parameters of the composition. This parameter change resolves the contradiction by enabling film formation while eliminating damage to the resist film, producing high-quality rectangular patterns without T-top deformation or surface roughness.
2Adaptability or versatility
If alcohol-based solvents are used, then the composition can be applied, but the applicability is limited by polymer structure
Solution Approach 1:
The ether-based solvent provides universal compatibility with various polymer structures in resist compositions. Unlike alcohol-based solvents that are limited by polymer structure, the ether-based solvent can be used with different polymer types, making the composition universally applicable while maintaining ease of manufacture and high-pattern quality.
3Device complexity
If conventional alcohol-based composition is used, then the process is simple, but the resist film suffers damage and swelling
Solution Approach 1:
The patent changes the solvent parameter from alcohol to ether, which fundamentally alters the interaction with the resist film. This parameter change eliminates harmful effects such as film damage and swelling while maintaining the simplicity of the composition and application process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The ether-based solvent composition minimizes resist film damage and allows for the formation of high-quality rectangular resist patterns, improving the resist pattern formation process and enhancing production efficiency.
Implementation Method 1
a composition for forming a resist protection film on a resist film and contains (a) an alkali-soluble polymer and (b) an ether-based solvent
Data Source
AI summary
Disclosed are: a composition for forming a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the structure of a resin used in a resist composition; and a method for forming a resist pattern by using the composition. Specifically, disclosed are: a composition for forming a resist protection film, which comprises (a) an alkali-soluble polymer and (b) an ether-based solvent; and a method for forming a resist pattern by using the composition.