In Situ EUV Optical Component Surface Treatment

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Solution Overview

Problem

Optical components in EUV and soft X-ray devices experience reduced reflectivity over time due to contamination, debris, and surface erosion, leading to decreased performance and shortened lifespan.

Innovation Solution

An in situ method where a source of surface materials is provided within the vacuum chamber to deposit material on reflecting surfaces during operation or pauses, covering contaminants and compensating for ablated material, using techniques like sputtering or chemical vapor deposition to enhance reflectivity and extend the lifetime of optical components.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the optical component operates continuously in the vacuum chamber, then productivity is improved, but reflectivity decreases due to contamination and debris accumulation

Engineering Contradiction:
Improvecontinuous operationVSAvoidreflectivity
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A source of surface material is provided in the vacuum chamber that deposits material onto the optical component's reflecting surface before significant contamination occurs. This preliminary deposition creates a fresh, high-reflectivity surface layer that prevents or covers contaminant accumulation, allowing the component to maintain reflectivity during continuous operation without requiring removal for cleaning.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system performs self-maintenance by using an in-situ material source that automatically replenishes the surface material on the optical component during operation. The deposited material compensates for ablated surface material and covers contaminants, enabling the component to restore its own reflectivity without external intervention or removal from the vacuum chamber.

Inventive Principle:
Principle #25Self-service

2Reliability

If the optical component is removed from the vacuum chamber for cleaning or maintenance, then reflectivity can be restored, but productivity decreases due to operational interruptions

Engineering Contradiction:
ImprovereflectivityVSAvoidoperational continuity
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The optical component performs self-maintenance through in-situ material deposition from a source within the vacuum chamber. The deposited surface material covers contaminants and compensates for ablation, allowing the component to restore its own reflectivity without requiring removal from the operating environment, thus eliminating operational interruptions.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

Instead of removing and externally cleaning the optical component, the system recovers reflectivity by depositing fresh surface material in-situ. This approach discards the need for external maintenance operations and recovers the reflective surface property continuously during operation through material deposition that covers or replaces degraded surface layers.

Inventive Principle:
Principle #34Discarding and recovering

3Reliability

If a thick top layer is applied to protect the underlying layers, then reliability is improved, but the lifetime is reduced due to increased ablation and roughness

Engineering Contradiction:
Improveprotection of underlying layersVSAvoidlifetime
Core Design Contradiction:
ReliabilityVSDuration of action of stationary object

Solution Approach 1:

Rather than relying on a thick protective layer that gradually degrades, the system applies fresh surface material preliminarily and continuously to the reflecting surface. This deposited material forms a renewed protective layer that compensates for ablation in real-time, preventing the accumulation of roughness and extending the component's lifetime beyond what a single thick initial layer could provide.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system changes the parameter of surface material thickness dynamically by continuously depositing material to compensate for ablation. Instead of using a fixed thick layer that degrades over time, the surface thickness is actively maintained through controlled deposition, keeping the protective function constant throughout the component's operational lifetime.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively maintains or improves reflectivity by covering contaminants and compensating for surface erosion, thereby extending the operational lifespan of optical components in EUV and soft X-ray devices.

Implementation Method 1

surface material from said source is deposited on said one or several reflecting surfaces during operation and/or during operation pauses

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Implementation Method 2

the debris material deposited on the reflecting surfaces of the EUV collector is removed by sputtering

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS9110390B2Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity
Publication Date: 2015.08.18 USHIO INC
  • US9110390B2 patent drawing
  • US9110390B2 patent drawing
  • US9110390B2 patent drawing

AI summary

A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.