EUV Pellicle Edge Reinforcement and Rupture Detection
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Solution Overview
Problem
Ruptured pellicles in EUV photolithography systems cause contamination and operational inefficiencies due to late detection, as they can travel through the system and introduce defects into semiconductor substrates, leading to disruptions during the chip production process.
Innovation Solution
The implementation of an edge reinforcement system for pellicles, which reduces stress concentrations by positioning a thicker edge reinforcement at the boundary between the center and peripheral parts of the pellicle, combined with electronic circuitry for real-time monitoring of electrical continuity and deflection, allowing for early detection of pellicle ruptures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a thin transparent pellicle membrane is used to protect the photomask, then particle protection is achieved, but the pellicle becomes prone to rupture and causes contamination
Solution Approach 1:
The patent applies a thicker reinforcement layer specifically at the edges and corners of the pellicle membrane where stress concentrations occur during handling and processing. This localized thickening provides enhanced mechanical strength at vulnerable areas while maintaining the thin transparent structure in the central area that protects the photomask, thus resolving the contradiction between particle protection and rupture resistance.
2Reliability
If real-time monitoring of electrical continuity is implemented, then early detection of pellicle rupture is achieved, but device complexity increases
Solution Approach 1:
The patent replaces complex mechanical sensing systems with an electrical continuity monitoring system. By embedding conductive elements or using the pellicle's inherent electrical properties, the system detects ruptures through simple electrical circuit interruption detection, significantly reducing device complexity while maintaining high reliability for rupture detection.
3Manufacturing precision
If the pellicle is positioned at a distance from the photomask to render particles out of focus, then printing quality is maintained, but the pellicle is more susceptible to damage from environmental factors
Solution Approach 1:
The patent implements localized reinforcement at the pellicle edges and mounting regions while keeping the central membrane area thin and transparent. This allows the pellicle to be positioned at the optimal distance for rendering particles out of focus, maintaining printing quality, while the reinforced edges provide enhanced durability against environmental factors and handling stresses.
Data Source
AI summary
The present disclosure is directed to a reinforcement system including: a framed pellicle including: a center part of a pellicle surrounded by a peripheral part of the pellicle, wherein the peripheral part is adhered to a pellicle frame; and an edge reinforcement for reinforcing the framed pellicle, positioned at a boundary between the center part of the framed pellicle and the pellicle frame.