EUV Target Nozzle Heating Gradient to Prevent Oxidant Clogging
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Solution Overview
Problem
In EUV light generation for semiconductor processes, the separation of oxidants from target materials leads to nozzle clogging and changes in output direction due to varying solubility of oxygen atoms with temperature, which existing technologies fail to effectively manage.
Innovation Solution
A target supply apparatus with a tank, nozzle, and multiple heaters, where the temperature of the first heater is greater than the second heater, controlling the temperature gradient to suppress oxidant separation and accumulation, ensuring consistent output direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the temperature of the target material is reduced, then the solubility of oxygen atoms increases, but oxidants separate and accumulate in the nozzle causing clogging
Solution Approach 1:
The heating system is segmented into multiple independent heating units (first heating unit, second heating unit, third heating unit) positioned at different locations within the tank. This allows different temperature zones to be created simultaneously, with higher temperatures near the nozzle to prevent oxidant separation and accumulation, while other zones can operate at lower temperatures for efficient target material processing.
Solution Approach 2:
Different temperature conditions are applied to different spatial locations within the target supply apparatus. The region near the nozzle maintains higher temperature to prevent oxidant accumulation, while other regions can have lower temperatures. This local quality control ensures that the specific temperature requirement for preventing clogging is met without unnecessarily heating the entire system.
2Productivity
If the temperature of the target material is reduced to improve processing efficiency, then oxidation resistance decreases, but oxidant separation and accumulation occur
Solution Approach 1:
The heating system is divided into multiple independent heating units positioned at different locations. This segmentation allows the system to maintain higher temperatures specifically in regions where oxidant accumulation is a risk (near the nozzle), while other regions can operate at lower temperatures for efficient processing, thus resolving the contradiction between productivity and oxidation resistance.
Solution Approach 2:
Different temperature conditions are applied locally to different zones within the apparatus. The local quality of heat distribution ensures that oxidation resistance is maintained in critical areas (near the nozzle) without compromising overall processing efficiency, as only specific regions require higher temperatures for oxidation prevention.
3Reliability
If a uniform temperature is applied throughout the tank, then the structure is simple, but oxidant separation occurs due to temperature variations near the nozzle
Solution Approach 1:
The heating system is segmented into multiple independent heating units (first, second, and third heating units) that can be controlled separately. This segmentation enables precise temperature control in different zones, particularly maintaining higher temperatures near the nozzle to prevent oxidant separation, while accepting the increased system complexity as necessary for achieving reliable oxidant control.
Solution Approach 2:
Different temperature conditions are applied to different spatial locations within the tank. The local quality approach creates a temperature gradient that prevents oxidant separation near the nozzle while maintaining simpler conditions in other areas. This resolves the contradiction by accepting localized complexity (multiple heating units) to achieve overall reliability in oxidant separation control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces nozzle clogging and maintains consistent output direction by controlling the temperature gradient within the target supply apparatus, enhancing the reliability of EUV light generation in semiconductor processes.
Implementation Method 1
a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater
Implementation Method 2
controlling the temperature gradient to suppress oxidant separation and accumulation
Implementation Method 3
a step of melting a target material by controlling the first heater and the second heater such that the temperature of the first heater is higher than the temperature of the second heater
Implementation Method 4
a step of holding a temperature of the target material within a predetermined temperature range by controlling the first heater and the second heater such that the temperature of the first heater is higher than the temperature of the second heater
Implementation Method 5
a step of hardening the target material by controlling the first heater and the second heater such that the temperature of the first heater is higher than the temperature of the second heater
Data Source
AI summary
A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.