EUV Target Supply Pressure Control for Material Conservation
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Solution Overview
Problem
Conventional target supply apparatuses for extreme ultraviolet light source systems waste target material when EUV light is not needed, as they continue to supply targets during wafer replacement and adjustments, leading to unnecessary consumption.
Innovation Solution
A target supply apparatus with a pressure control system that adjusts gas pressure inside a tank using a pressure regulator and valves, allowing the target material to be selectively supplied and stopped based on demand, using a pressure-increase system and pressure-decrease system controlled by a controller.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the target supply apparatus continuously supplies target material to maintain readiness, then the system is ready for immediate EUV light generation, but target material is wasted during periods when EUV light is not needed
Solution Approach 1:
The patent implements dynamic pressure control within the tank, switching between high pressure (for immediate target supply and EUV generation readiness) and low pressure (for target material conservation during idle periods). This dynamic adjustment of operating conditions allows the system to balance readiness with material efficiency.
Solution Approach 2:
The invention changes the pressure parameter as a control variable to regulate target material supply. By adjusting pressure between high and low states based on operational needs, the system optimizes both readiness and material consumption, directly addressing the contradiction between continuous supply and waste reduction.
2Speed
If the gas pressure inside the tank is increased to accelerate target material supply, then the supply speed improves, but the risk of target material leakage or uncontrolled output increases
Solution Approach 1:
The patent incorporates feedback control mechanisms including pressure sensors and controllers that continuously monitor tank pressure and target supply conditions. This feedback loop allows the system to adjust pressure in real-time, accelerating supply when needed while preventing excessive pressure that could cause leakage or uncontrolled output.
Solution Approach 2:
The invention replaces simple mechanical pressure increase with a controlled gas supply system using gas supply sources and pressure regulators. This substitution allows precise control of pressure increase, achieving fast target supply while maintaining safety through regulated gas flow rather than uncontrolled pressure buildup.
3Manufacturing precision
If the pressure control system uses multiple valves and gas passages to enable precise pressure regulation, then target material supply control improves, but the device complexity increases
Solution Approach 1:
The patent divides the pressure control function into separate components: pressure increase gas passages with supply valves, and pressure decrease gas passages with exhaust valves. This segmentation allows independent control of pressure up and down, achieving precise regulation while organizing complexity into manageable, functional modules.
Solution Approach 2:
The pressure control system uses universal components (valves, gas passages, pressure regulators) that serve multiple functions. For example, the same tank and nozzle structure handles both storage and supply functions, while pressure sensors provide both monitoring and control feedback. This multi-functionality reduces overall system complexity despite the need for precise control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces wasteful consumption of target material by only supplying it when needed, optimizing the use of target material in extreme ultraviolet light source systems.
Implementation Method 1
a gas supply source for supplying gas into the tank, and the target supply apparatus controlling a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source
Implementation Method 2
a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port; a pressure-decrease valve provided on the pressure-decrease gas passage
Data Source
AI summary
A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.