Fe-Co Sputtering Target Crack Suppression via Nb-Ta Alloying
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Solution Overview
Problem
Fe—Co-based alloy sputtering target materials experience cracking issues during high-input-power sputtering, which compromises the formation of soft magnetic films with amorphous structures and corrosion resistance.
Innovation Solution
Optimizing the composition of the Fe—Co-based alloy sputtering target material by adjusting the bending fracture strain at 300°C to 0.4% or more, incorporating specific atomic ratios of elements like Ta, Nb, and Mo, and controlling the sintering conditions to suppress crack generation and enhance mechanical properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high input power sputtering is used to increase productivity, then film formation efficiency is improved, but cracks are generated in the sputtering target material
Solution Approach 1:
The patent changes the compositional parameters of the sputtering target material by incorporating specific amounts of Nb (5-15 atom%) and Ta (5-15 atom%) elements into the Fe-Co alloy system. This compositional modification alters the material's thermal and mechanical properties, enabling it to withstand high input power sputtering conditions without cracking while maintaining high productivity
Solution Approach 2:
The patent creates a composite alloy system combining Fe, Co, Nb, and Ta elements with specific compositional ratios. This multi-element composite structure provides both the high productivity needed for efficient film formation and the crack resistance required for reliable operation under high input power conditions
2Reliability
If Fe-Co alloy composition is optimized for soft magnetic characteristics, then film performance is improved, but corrosion resistance deteriorates
Solution Approach 1:
The patent develops a composite alloy system that combines Fe-Co (for soft magnetic properties) with Nb and Ta (for corrosion resistance). This multi-element composite achieves both excellent soft magnetic characteristics and high corrosion resistance simultaneously, resolving the trade-off between these two properties
Solution Approach 2:
The patent uses Nb and Ta elements to provide localized corrosion resistance protection while maintaining the Fe-Co alloy's soft magnetic properties. The refractory elements create a protective effect that enhances corrosion resistance without compromising the magnetic performance of the Fe-Co base alloy
3Shape
If single element (Ta or Nb) is added to Fe-Co alloy, then amorphous structure formation is promoted, but control of components becomes difficult
Solution Approach 1:
The patent merges the functions of both Nb and Ta elements into a single alloy system. By combining these two elements that both promote amorphous structure formation, the patent achieves reliable amorphous structure control while simplifying the overall component specification through defined compositional ranges rather than requiring precise single-element control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents cracking during high-power sputtering, enabling the stable formation of soft magnetic films with excellent soft magnetic characteristics and high corrosion resistance.
Implementation Method 1
a Fe—Co-based alloy sputtering target material for forming a soft magnetic film in a magnetic recording medium
Implementation Method 2
the method of using a Fe—Co-based alloy sputtering target material is produced by mixing pure metal powder raw materials each having a metal purity of 99.9% or higher so as to obtain the composition of the sputtering target material, and sintering the mixed powder thus obtained
Data Source
AI summary
Provided is a Fe—Co-based alloy sputtering target material having a composition represented as an atomic ratio by the compositional formula: (Fea—Co100-a)100-b-c-d—Tab—Nbc-Md, wherein 0<a≦80, 0≦b≦10, 0≦c≦15, 5≦b+c≦15, 2≦d≦20, 15≦b+c+d≦25, and M represents one or more elements selected from the group consisting of Mo, Cr and W, with the balance consisting of unavoidable impurities, wherein the sputtering target material has a bending fracture strain εfB at 300° C. of 0.4% or more.