Fe-Pt Sputtering Target with Dispersed Carbon
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Solution Overview
Problem
The challenge is to produce a magnetic thin film with a granular structure for high-density magnetic recording media without using expensive co-sputtering apparatuses, while addressing the issues of carbon not being sinterable and prone to aggregation during sputtering, leading to particle detachment and film defects.
Innovation Solution
A sputtering target with carbon particles uniformly dispersed in an Fe—Pt alloy, characterized by a high peak intensity ratio of G-band to D-band in Raman scattering spectrometry (IG/ID ≥ 5.0), achieving high relative density (>90%) and optimized composition (5-60 mol% Pt, 10-70 mol% C) to enhance sinterability and prevent particle formation during sputtering.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If carbon is added to Fe-Pt alloy to form granular magnetic thin film, then magnetic characteristics are improved, but particle detachment and film defects occur during sputtering
Solution Approach 1:
The patent changes the physical and chemical parameters of carbon by controlling its crystallinity (represented by IG/ID ratio ≥ 5.0), particle size (0.1-10 μm), and content (10-70 mol%). These parameter changes transform carbon from a problematic amorphous state to a controlled crystalline state that prevents particle detachment while maintaining magnetic film characteristics.
Solution Approach 2:
The patent creates a composite material system where carbon particles with specific crystalline structures are dispersed in Fe-Pt alloy. The composite structure combines the magnetic properties of Fe-Pt with the non-magnetic isolation properties of carbon, achieving granular film structure that prevents superparamagnetization while maintaining high crystal magnetic anisotropy.
2Reliability
If carbon content is increased to enhance magnetic characteristics, then sinterability deteriorates due to carbon's resistance to sintering
Solution Approach 1:
The patent applies parameter changes by controlling carbon's crystallinity (IG/ID ratio) and particle size to optimize sinterability. The specific parameters (crystalline carbon with IG/ID ≥ 5.0, particle size 0.1-10 μm) enable effective sintering even at high carbon content (10-70 mol%), achieving relative density ≥ 90% while maintaining high carbon content for superior magnetic characteristics.
Solution Approach 2:
The patent applies local quality by creating non-uniform distribution of carbon particles with different sizes and crystallinity levels within the Fe-Pt alloy matrix. This local variation in carbon properties optimizes both sintering behavior (where lower crystallinity aids bonding) and magnetic performance (where higher crystallinity prevents particle detachment).
3Reliability
If conventional sputtering method is used to produce granular magnetic thin film, then expensive co-sputtering apparatus is required
Solution Approach 1:
The patent merges carbon and Fe-Pt materials into a single sputtering target rather than using separate co-sputtering processes. This consolidation eliminates the need for expensive co-sputtering apparatus while producing the desired granular magnetic thin film structure with carbon-dispersed Fe-Pt particles.
Solution Approach 2:
The patent segments the target material into distinct phases (carbon particles and Fe-Pt alloy matrix) with specific size distributions and spatial arrangements. This segmentation approach, combined with controlled sintering, enables single-target sputtering to produce granular film structure that would otherwise require complex multi-target systems.
4Manufacturing precision
If carbon particles are dispersed in Fe-Pt alloy to achieve high density, then particle aggregation occurs during sputtering
Solution Approach 1:
The patent stabilizes carbon particle dispersion by changing key parameters: crystallinity (IG/ID ratio ≥ 5.0), particle size (0.1-10 μm), and content (10-70 mol%). These parameter changes create optimal interfacial interactions between carbon and Fe-Pt, preventing aggregation during sputtering while achieving high relative density (≥ 90%).
Solution Approach 2:
The Fe-Pt alloy matrix acts as an intermediary medium that disperses and stabilizes carbon particles. The specific composition (5-60 mol% Pt, balance Fe) and controlled sintering process create optimal adhesion between carbon particles and the matrix, preventing aggregation while maintaining high density and uniform dispersion.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively inhibits particle formation during sputtering, improving film yield and quality by ensuring high carbon dispersion and sinterability, thus enabling the production of magnetic thin films with a granular structure without the need for costly co-sputtering equipment.
Implementation Method 1
C is a material which is not susceptible to be sintered
Implementation Method 2
a magnetic thin film is produced by sputtering a sputtering target made of the above-mentioned materials
Implementation Method 3
a peak intensity ratio (IG/ID) of a G-band to a D-band of 5.0 or more in Raman scattering spectrometry
Data Source
AI summary
Provided is a sputtering target for a magnetic recording film. The sputtering target has a peak intensity ratio (IG/ID) of a G-band to a D-band of 5.0 or more in Raman scattering spectrometry. It is an object of the present invention to produce a magnetic thin film having a granular structure without using a high cost co-sputtering apparatus and to provide a sputtering target, in particular, an Fe—Pt-based sputtering target for a magnetic recording film, where carbon particles are dispersed in the target. Since carbon is a material which is not susceptible to being sintered and is susceptible to form aggregates, a conventional carbon-containing sputtering target has the problem that detachment of carbon lumps occurs during sputtering to result in generation of a large number of particles on the film. The present invention also addresses the problem of providing a high density sputtering target that can overcome the disadvantages.