FIB-SEM Device Processing Method for Fabrication Time Reduction
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Solution Overview
Problem
The existing technique for fabricating MEMS devices requires a long time from the start of prototype structure fabrication to the completion of the real structure due to the serial nature of the fabrication process, where the total fabrication time for both structures is additive, and lacks automation for comparison inspection, especially failing to measure internal sizes effectively.
Innovation Solution
A device processing method and apparatus that combines an FIB-SEM unit with a computer system to fabricate a first structure under a first condition, measure its size, compare it with design data, and determine a second condition for fabricating a second structure under the FIB-SEM unit, allowing for in-line processing without destabilizing the vacuum condition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the fabrication of the prototype structure and the real structure are performed in series, then the manufacturing precision can be ensured through comparison inspection, but the total fabrication time becomes the sum of both fabrication times
Solution Approach 1:
The patent combines the fabrication of the prototype structure and the real structure into a single simultaneous processing step using one ion beam. The processing apparatus fabricates both structures in parallel within the same chamber, eliminating the need for separate fabrication sequences while maintaining the ability to compare and adjust parameters for precision control.
2Manufacturing precision
If the fabrication process is performed manually with step-by-step comparison and adjustment, then the manufacturing precision can be improved through iterative correction, but the operation complexity and time consumption increase
Solution Approach 1:
The patent implements an automated feedback mechanism where the processing parameters for the real structure are automatically adjusted based on the measured dimensions of the prototype structure. The control unit compares the prototype measurements with design specifications and automatically modifies the ion beam parameters for subsequent real structure fabrication, eliminating manual intervention while maintaining precision.
Solution Approach 2:
The system performs self-correction by automatically using the prototype structure as a reference standard to adjust its own processing parameters. The apparatus measures the prototype, calculates the necessary parameter adjustments, and applies these corrections to the real structure fabrication without external intervention, making the system self-regulating and self-optimizing.
3Manufacturing precision
If multiple fabrication attempts are made when the desired structure is not achieved, then the manufacturing precision can be improved through iterative refinement, but the total fabrication time accumulates with each attempt
Solution Approach 1:
The patent performs preliminary fabrication of a prototype structure that serves as a test specimen for determining optimal processing parameters. By fabricating and measuring the prototype first within the same processing session, the system establishes corrected parameters before producing the real structure, preventing the need for repeated fabrication attempts and eliminating time accumulation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time from the start of prototype structure fabrication to the completion of the real structure by automating the comparison and measurement process, enabling efficient fabrication of the real structure without adding fabrication time in series and allowing internal size measurement.
Implementation Method 1
fabricating a first structure using an ion beam under a first condition
Implementation Method 2
fabricating a first structure using an ion beam under a first condition in a first region on a substrate
Implementation Method 3
measuring a size of the first structure which is fabricated
Data Source
AI summary
The invention is directed to a technique for reducing the time from the start of fabrication of a prototype structure to the completion of fabrication of a real structure. A device processing method includes steps of: fabricating a first structure using an ion beam under a first condition in a first region on a substrate; measuring a size of the first structure which is fabricated; comparing the measurement result with design data; determining a second condition from the comparison result; and fabricating a second structure using the ion beam under the second condition in a second region on the substrate.