Finned Shutter Disk for Uniform Deposition
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Solution Overview
Problem
Conventional pasting processes in semiconductor manufacturing result in non-uniform deposition on process chamber surfaces, leading to particle issues on substrates due to uneven distribution of target material on shutter disks.
Innovation Solution
A shutter disk design with a central horizontal planar surface and radially outward angled structures, fabricated from materials like aluminum or titanium, ensures uniform deposition of target material onto process chamber walls and corners, reducing shear stress and brittleness while maintaining structural integrity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional flat shutter disk is used, then the structure is simple and easy to manufacture, but the deposition uniformity on process chamber surfaces deteriorates
Solution Approach 1:
The shutter disk incorporates angled structures (fins) at specific radial locations to create localized variations in surface geometry. These fins have specific angles (e.g., 45 degrees) and heights that are optimized for their local function of directing material deposition onto corner regions of the process chamber, thereby achieving uniform overall deposition through localized structural modifications.
Solution Approach 2:
The invention transitions from a conventional two-dimensional flat shutter disk surface to a three-dimensional structure by adding radially outward extending fins with specific angles. This dimensional enhancement allows the shutter disk to project material onto vertical or angled surfaces of the process chamber that were previously inaccessible, improving deposition uniformity across all chamber surfaces including corners and edges.
2Manufacturing precision
If target material is concentrated on shutter disk corners, then corner coverage is improved, but shear stress and brittleness increase
Solution Approach 1:
The fin structures are designed with optimized parameters including height, angle, and radial extent to balance material projection capability with structural strength. The angles are specifically chosen (e.g., 45 degrees) to optimize material direction while the fin heights are controlled to provide sufficient structural support, preventing excessive brittleness and shear stress concentration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design enhances pasting uniformity, reducing particle issues and maintaining structural integrity during high-power and high-temperature processes, thereby improving the cleanliness and reliability of substrate processing.
Implementation Method 1
a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion
Data Source
AI summary
Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.