Flow Control Ring Separates Gas Channels in Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In substrate processing apparatuses, the filling gas used to prevent reaction gas from entering the bottom of the reactor can contaminate the substrate and damage chamber components, reducing yield and shortening the apparatus' lifespan.
Innovation Solution
A substrate processing apparatus design featuring a flow control ring that separates the first gas channel from the reaction space and the second gas channel from the lower space, ensuring they meet outside the reaction space, preventing collisions and turbulent flows, and utilizing a curved structure to enhance gas exhaust efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If filling gas is supplied from the bottom of the reactor to balance pressure between reaction space and lower space, then reaction gas is prevented from entering the lower space, but the filling gas collides with reaction gas causing turbulent flow that contaminates the substrate and damages chamber components
Solution Approach 1:
The exhaust system is segmented into separate exhaust paths: a first exhaust path for reaction gas from the reaction space and a second exhaust path for filling gas from the lower space. This segmentation prevents the collision and turbulent flow between the two gas streams, eliminating substrate contamination while maintaining pressure balance functionality.
Solution Approach 2:
A separate exhaust path acts as an intermediary channel that allows filling gas to be exhausted independently from the reaction space. This intermediary path prevents direct interaction between filling gas and reaction gas, resolving the harmful collision effect while preserving the pressure balancing function of the filling gas.
2Reliability
If filling gas is used to prevent reaction gas from entering the bottom of the reactor, then pressure balance is achieved, but chamber components are damaged and the apparatus lifespan is shortened
Solution Approach 1:
The exhaust system is divided into separate paths for reaction gas and filling gas, preventing harmful interactions that damage chamber components. This segmentation maintains the pressure balance function while eliminating the corrosive effects on chamber components, thereby extending apparatus lifespan.
Solution Approach 2:
The separate exhaust path for filling gas converts the potentially harmful collision effect into a beneficial independent exhaust flow. The filling gas continues to perform its pressure balancing function while being exhausted separately, preventing damage to chamber components and extending apparatus life.
3Reliability
If filling gas is supplied to balance pressure, then reaction gas is kept out of the lower space, but the collision between filling gas and reaction gas creates turbulent flow affecting substrate processing
Solution Approach 1:
The exhaust system is segmented into separate paths that prevent mixing of filling gas and reaction gas. This segmentation eliminates turbulent flow in the reaction space, maintaining stable substrate processing conditions while preserving the pressure balance function of the filling gas.
Solution Approach 2:
A separate exhaust path serves as an intermediary channel that allows filling gas to be removed independently without interfering with the reaction space. This intermediary path eliminates turbulent flow effects on the substrate while maintaining the pressure balancing function.
Data Source
AI summary
A substrate processing apparatus capable of minimizing the effect of a filling gas in a lower space on the processing of a substrate includes: a substrate supporting unit; a processing unit on the substrate supporting unit; and an exhaust unit connected to a reaction space between the substrate supporting unit and the processing unit, wherein a first gas in the reaction space and a second gas in a lower space below the substrate supporting unit meet each other outside the reaction space.