Flow Rate Control in Substrate Processing Apparatus

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Solution Overview

Problem

Existing substrate processing apparatuses fail to monitor and adjust the supply flow rate of processing fluids accurately, particularly during the transition from zero to a specific flow rate, leading to variations and potential processing inconsistencies.

Innovation Solution

A processing apparatus equipped with a chamber, nozzle, measuring unit, opening/closing unit, and controller that monitors and adjusts the supply flow rate by integrating the measured flow rate, sampling instantaneous values, and correcting deviations to ensure consistent fluid delivery according to preset target values.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a flowmeter is used to monitor the supply flow rate of processing liquid, then the flow rate can be measured, but the flow rate cannot be accurately controlled during the transition from zero to specific flow rate

Engineering Contradiction:
Improveflow rate measurementVSAvoidflow rate control consistency
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The system continuously monitors the supply flow rate using a flowmeter and feeds this information back to the controller. The controller compares the measured flow rate with the target flow rate and adjusts the opening degree of the opening/closing unit accordingly. This closed-loop feedback control ensures accurate flow rate control during the transition from zero to specific flow rate, resolving the contradiction between measurement capability and control reliability.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The opening/closing unit dynamically adjusts its opening degree based on real-time flow rate measurements rather than maintaining a fixed position. The controller continuously modifies the valve opening to compensate for variations in flow rate during the transition phase, enabling adaptive control that maintains consistency despite changing conditions.

Inventive Principle:
Principle #15Dynamics

2Extent of automation

If the opening/closing unit is operated according to preset recipe information, then the processing can be automated, but variations in supply flow rate during operation cannot be corrected

Engineering Contradiction:
Improveprocessing automationVSAvoidprocessing consistency
Core Design Contradiction:
Extent of automationVSManufacturing precision

Solution Approach 1:

The system combines automated recipe-based control with real-time feedback from the flowmeter. While the opening/closing unit operates according to preset recipe information for automation, the system continuously monitors actual flow rate and makes real-time adjustments to maintain the target flow rate. This hybrid approach preserves automation while ensuring processing consistency through active correction of flow rate variations.

Inventive Principle:
Principle #23Feedback

3Device complexity

If the supply flow rate is not monitored during transition phase, then the system operation is simple, but processing accuracy deteriorates due to flow rate variations

Engineering Contradiction:
Improvesystem operation simplicityVSAvoidprocessing accuracy
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The flowmeter provides continuous feedback during the transition phase from zero to specific flow rate, enabling the controller to detect and correct flow rate variations. This monitoring and correction mechanism, while adding some complexity, ensures processing accuracy by maintaining precise control during the critical transition period when flow rate stability is most challenging.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS11135698B2Processing apparatus, processing method, and storage medium
Publication Date: 2021.10.05 TOKYO ELECTRON LTD
  • US11135698B2 patent drawing
  • US11135698B2 patent drawing
  • US11135698B2 patent drawing

AI summary

Disclosed is a processing apparatus that includes a chamber accommodating a workpiece, a nozzle provided within the chamber, a measuring unit measuring the supply flow rate of the processing fluid supplied to the nozzle, an opening/closing unit performing opening/closing of the flow path of the processing fluid, and a controller. The controller sends an opening/closing operation signal that causes the opening/closing unit to perform an opening/closing operation according to recipe information that indicates processing contents. After sending the opening/closing operation signal to the opening/closing unit according to the recipe information, the controller starts the integration of the supply flow rate based on the measurement result of the measuring unit, monitors the rise of the supply flow rate based on the calculated integrated amount, and when supplying a specific flow rate, monitors the supply flow rate based on a value actually measured by the measuring unit.