Fluid Supply Filter Exhaust Line Upstream Branching
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In semiconductor manufacturing, the fine patterns on substrates retain organic solvents during drying processes, leading to residual contamination, and existing cleaning methods do not effectively extend the life of filters used in fluid supply lines due to accumulated contaminants.
Innovation Solution
The apparatus and method involve a fluid supply system with a filter upstream of the exhaust line, allowing bi-directional fluid movement to clean accumulated contaminants and improve filter life by venting the fluid through an exhaust line branching upstream of the filter.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the exhaust line is connected downstream of the filter, then the filter protects the chamber during normal operation, but contaminants accumulate in the filter reducing its lifespan
Solution Approach 1:
The patent applies reverse flow cleaning by connecting the exhaust line upstream of the filter and using backward flow to flush contaminants from the filter. During normal operation, fluid flows forward through the filter for protection. During cleaning, the exhaust valve opens to allow reverse flow from the exhaust line through the filter, carrying accumulated contaminants backward to the exhaust line for removal, thereby extending filter lifespan without compromising protection function
2Ease of repair
If the exhaust line branches upstream of the filter, then filter cleaning is enabled, but system complexity increases
Solution Approach 1:
The patent merges the cleaning function into the existing exhaust line infrastructure by branching the exhaust line upstream of the filter rather than adding a separate cleaning system. The exhaust line serves dual purposes: normal exhaust during operation and reverse flow cleaning when the exhaust valve opens. This integration avoids additional complex components while enabling effective filter cleaning
Solution Approach 2:
The system performs self-cleaning by utilizing its own exhaust line and pressure differential. When the exhaust valve opens, the pressure difference automatically drives reverse flow through the filter, flushing contaminants into the exhaust line without requiring external cleaning equipment or manual intervention, thereby simplifying the overall system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively cleans accumulated contaminants in the filter, enhancing its lifespan and ensuring cleaner fluid supply for substrate treatment processes, particularly in supercritical fluid treatments.
Implementation Method 1
a filter (580) installed on the supply line (540)
Implementation Method 2
a pressure-reducing member (562) provided on the exhaust line (560) for reducing the pressure of the exhaust line
Implementation Method 3
controller (590) for controlling a valve (564) installed on the exhaust line (560)
Implementation Method 4
The treating unit is a unit for treating a substrate with supercritical fluid and the fluid may comprise supercritical carbon dioxide (CO2)
Data Source
AI summary
Provided is an apparatus and method for supplying a fluid. The substrate treating apparatus comprises a treating unit for treating a substrate and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises a supply tank in which the fluid is stored, a supply line connecting the supply tank and the treating unit to supply the fluid from the supply tank to the treating unit, a filter installed on the supply line, and an exhaust line branching from the supply line, wherein a branch point of the exhaust line in the supply line is located upstream of the filter.