Fluorinated Electrode Patterning for Maskless Transparent Displays

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Solution Overview

Problem

Current electrode patterning methods for display devices, such as shadow mask and laser techniques, face challenges like distortion during high-temperature deposition and substrate damage, making them unsuitable for mass production and requiring high costs and time for mask maintenance, and are inefficient in achieving high light transmittance for UDC camera operation.

Innovation Solution

A fluorinated compound represented by Formula (1) is used for patterning metals or electrodes, allowing for precise electrode formation without a shadow mask and enabling high light transmittance in transparent display devices, facilitating the application of UDC technology.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If shadow mask is used for electrode patterning, then electrode pattern can be formed, but mask bending occurs during high-temperature deposition causing pattern distortion and increased maintenance cost

Engineering Contradiction:
Improveelectrode pattern precisionVSAvoidmask shape stability
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent removes the shadow mask component entirely from the electrode patterning process. Instead of using a physical mask that bends and distorts, the invention employs a photomaskless approach where the electrode pattern is directly formed through controlled deposition without requiring a separate mask layer, thereby eliminating mask-related stability issues.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical shadow mask system with a photomaskless deposition process. The mechanical mask that physically blocks deposition is substituted by a controlled deposition method that achieves patterning through precise control of the deposition process itself, eliminating mechanical wear and thermal deformation problems.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If laser is used for electrode patterning, then electrode pattern can be formed, but substrate may be damaged due to high energy concentration

Engineering Contradiction:
Improveelectrode pattern precisionVSAvoidsubstrate damage
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the high-energy laser system with a photomaskless deposition approach. Instead of using concentrated laser energy to ablate or pattern the electrode, the invention uses controlled material deposition that forms patterns through precise spatial control of the deposition source, eliminating thermal damage and high-energy harmful effects on the substrate.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the fundamental parameters of the patterning process from high-energy laser ablation to low-energy controlled deposition. By controlling deposition rate, source-to-substrate distance, and deposition time, the process achieves precise patterning without the harmful high-energy effects that cause substrate damage.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If shadow mask is used for electrode patterning, then electrode pattern can be formed, but production time and cost increase due to mask maintenance requirements

Engineering Contradiction:
Improveelectrode pattern precisionVSAvoidmass production efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent extracts and removes the shadow mask component from the production system. By eliminating the mask entirely and using direct photomaskless deposition, the process removes the need for mask fabrication, installation, alignment, and maintenance operations, thereby reducing production time and costs while enabling true mass production.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent adopts a disposable photomask approach where inexpensive, single-use photomasks are employed instead of expensive, reusable shadow masks. These photomasks can be easily replaced without requiring complex maintenance or realignment procedures, significantly reducing production time and cost for mass production while maintaining pattern precision.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Data Source

PatentUS11856841B2Compound for organic electronic element, organic electronic element using the same, and an electronic device thereof
Publication Date: 2023.12.26 DUK SAN NEOLUX
  • US11856841B2 patent drawing
  • US11856841B2 patent drawing
  • US11856841B2 patent drawing

AI summary

Provided are a fluorinated compound for patterning a metal or an electrode (cathode), an organic electronic element using the same, and an electronic device thereof, wherein a fine pattern of the electrode is formed by using the fluorinated compound as a material for patterning a metal or an electrode (cathode), without using a shadow mask, and it is possible to more easily apply UDC since it is easy to manufacture a transparent display having high light transmittance.