Foamed Polyurethane Polishing Pad S Phase Control
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Solution Overview
Problem
Conventional polishing pads generate frictional heat during polishing, causing changes in hardness and potential damage to the object being polished, leading to unstable polishing results.
Innovation Solution
A polishing pad formed by foamed polyurethane with a high content of S phase, exceeding 70% as determined by pulsed NMR measurement at 25°C, and maintaining an S phase ratio of 80% or more at 60°C, which increases the crystallization and hard segment ratio, reducing hardness changes with temperature.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional polishing pads are used, then polishing can be performed, but frictional heat causes hardness changes and potential damage to the object being polished
Solution Approach 1:
The patent changes the chemical composition parameters of the foamed polyurethane by controlling the S phase content to exceed 70% at 25°C and maintaining 80% or more at 60°C. This parameter modification reduces temperature-induced hardness changes, thereby resolving the contradiction between achieving stable polishing performance and preventing hardness changes caused by frictional heat.
2Productivity
If frictional heat is generated during polishing, then polishing action is achieved, but the object to be polished cannot be sufficiently polished or is damaged
Solution Approach 1:
By modifying the physical parameters of the polishing pad material - specifically controlling the S phase content to remain above 70% at 25°C and above 80% at 60°C - the patent maintains dimensional stability and hardness consistency under frictional heat conditions. This ensures both sufficient polishing capability and prevention of damage to the object being polished.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polishing pad exhibits a minimal change in hardness with temperature fluctuations, ensuring stable polishing performance by maintaining intermolecular forces between hard segments and suppressing soft segment motion, thus preventing hardness decrease.
Implementation Method 1
a content of S phase in the foamed polyurethane, as determined by pulsed NMR measurement at 25° C., exceeding 70%
Implementation Method 2
increases the crystallization and hard segment ratio, reducing hardness changes with temperature
Data Source
AI summary
The present invention is a polishing pad formed by foamed polyurethane, with a content of S phase in the foamed polyurethane, as determined by pulsed NMR measurement at 25° C., exceeding 70%.