Focus Ring Replacement Without Breaking Plasma Chamber Vacuum

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Solution Overview

Problem

The existing methods for replacing focus rings in plasma processing systems are time-consuming and reduce productivity due to the need to open the process chamber to the atmosphere, preventing simultaneous processing of substrates during replacement.

Innovation Solution

A method using a transfer device to remove and replace focus rings within the plasma processing system without opening the process chamber to the atmosphere, including cleaning the mount table and transferring new focus rings, allowing for continuous operation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If the process chamber is opened to the atmosphere for manual focus ring replacement, then the focus ring can be replaced, but the replacement time increases and productivity decreases

Engineering Contradiction:

Improvefocus ring replacementVSAvoidsubstrate processing productivity

Core Design Contradiction:

Ease of operationVSProductivity

Solution Approach 1:

A transfer device is introduced as an intermediary mechanism to remove and install focus rings without opening the process chamber to atmosphere. The transfer device operates within the sealed chamber environment, using mechanical manipulation to extract the worn focus ring and install the new one, thus eliminating the need for chamber opening while maintaining replacement capability

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The focus ring replacement operation is extracted from the atmospheric environment and moved into the sealed process chamber environment. By taking out the replacement operation from the external atmosphere and performing it internally within the chamber using the transfer device, the system eliminates the need to open the chamber, thereby maintaining vacuum integrity and enabling continuous substrate processing

Inventive Principle:

Principle #2Taking out (Extraction)

2Ease of operation

If the process chamber is opened to the atmosphere for focus ring replacement, then the focus ring can be replaced, but the time required for replacement increases

Engineering Contradiction:

Improvefocus ring replacementVSAvoidfocus ring replacement time

Core Design Contradiction:

Ease of operationVSLoss of time

Solution Approach 1:

The transfer device enables continuous operation by performing focus ring replacement without interrupting the plasma processing workflow. The replacement occurs within the sealed chamber during or between substrate processing cycles, eliminating the downtime associated with chamber opening, atmospheric exposure, and re-vacuuming procedures

Inventive Principle:

Principle #20Continuity of useful action

Solution Approach 2:

The transfer device acts as a time-efficient intermediary that performs the replacement operation rapidly within the chamber. By using automated mechanical manipulation instead of manual operations requiring chamber opening, the replacement time is significantly reduced while maintaining the ability to properly remove and install focus rings

Inventive Principle:

Principle #24Intermediary (Mediator)

3Ease of operation

If manual replacement method is used by opening the process chamber, then the focus ring can be replaced, but contamination risk increases and processing conditions become inconsistent

Engineering Contradiction:

Improvefocus ring replacementVSAvoidprocessing condition consistency

Core Design Contradiction:

Ease of operationVSReliability

Solution Approach 1:

The transfer device operates within the sealed process chamber that maintains a controlled inert or vacuum environment throughout the replacement process. This prevents atmospheric contamination of the focus ring and chamber interior, ensuring that the replacement occurs in a clean environment consistent with plasma processing requirements

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The transfer device serves as a contamination-free intermediary that transfers the focus ring within the sealed chamber environment. By keeping the replacement operation enclosed within the chamber rather than exposing it to atmosphere, the system maintains consistent processing conditions and prevents contamination that would occur with manual opening and closing operations

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS12094696B2Focus ring replacement method and plasma processing system

Publication Date: 2024.09.17 TOKYO ELECTRON LTD

AI summary

A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the first focus ring is transferred out of the process chamber, controlling the plasma processing apparatus to clean the surface of the mount table; and after the surface of the mount table is cleaned, controlling the transfer device to transfer a second focus ring into the process chamber and place the second focus ring on the surface of the mount table without opening the process chamber to the atmosphere.