Focused Ion Beam System Wide-Range FIM Observation
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Solution Overview
Problem
Focused ion beam systems with gas field ion sources face challenges in acquiring wide-range field ion microscope (FIM) images due to structural obstructions and MCP image degradation, limiting the visual field and accuracy of tip sharpening during field-assisted gas etching.
Innovation Solution
A focused ion beam system with a gas field ion source, an ion gun unit, a beam optical system, and an image acquiring mechanism that includes an alignment electrode, alignment control unit, storage unit, and image processing unit to combine FIM images of different visual fields, allowing for wide-range FIM observation and accurate tip sharpening by adjusting the ion beam radiation direction and combining images based on bright point patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the condenser lens is disposed close to the emitter to secure focused ion beam performance, then the beam focusing capability is improved, but the visual field for FIM observation is narrowed due to structural obstruction
Solution Approach 1:
The patent divides the observation task into multiple segments by capturing several FIM images from different visual fields and combining them through image processing. This allows the condenser lens to remain close to the emitter for optimal beam focusing while still achieving wide-range observation by synthesizing multiple partial views into a comprehensive image.
Solution Approach 2:
The patent transitions from a single two-dimensional visual field view to a composite view by capturing images at different angular positions and combining them. This dimensional approach to image synthesis overcomes the physical obstruction caused by the close proximity of the condenser lens to the emitter.
2Measurement precision
If the MCP is used to amplify the ion beam for FIM observation, then the image detection capability is improved, but the MCP performance degrades over time causing image darkening
Solution Approach 1:
The patent implements periodic replacement or regeneration of the MCP component to maintain its amplification performance. By scheduling regular maintenance intervals, the system ensures that the MCP does not degrade to a point where image quality is compromised, thus maintaining reliable FIM observation capability over extended operational periods.
Solution Approach 2:
The system includes automated monitoring and control mechanisms that detect MCP performance degradation and trigger appropriate responses such as adjusting observation parameters or scheduling maintenance, reducing the need for manual intervention and ensuring continuous reliable operation.
3Manufacturing precision
If field-assisted gas etching is performed to sharpen the emitter tip, then the tip sharpness is improved, but the etching progress cannot be accurately monitored due to limited visual field
Solution Approach 1:
The patent segments the etching monitoring process into multiple observation steps, capturing FIM images at different stages and angles. By combining these segmented views through image processing, the system provides comprehensive monitoring of the etching progress, enabling accurate assessment of tip sharpness development throughout the field-assisted gas etching process.
Solution Approach 2:
The system provides real-time feedback on etching progress by continuously capturing and processing FIM images, allowing operators to monitor tip morphology changes and adjust etching parameters accordingly to achieve the desired sharpness while preventing over-etching or damage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate wide-range FIM observation and tip sharpening, overcoming structural obstructions and image degradation issues, ensuring the emitter tip is maintained in an ideal sharp state for enhanced performance.
Implementation Method 1
a gas field ion source which includes an emitter with a sharp tip, and which is configured to ionize a gas at the tip of the emitter to generate gas ions
Implementation Method 2
an ion gun unit which is configured to accelerate the gas ions and radiate the gas ions as an ion beam
Implementation Method 3
a beam optical system which includes at least a focusing lens electrode, and is configured to radiate the ion beam onto the sample while focusing the ion beam
Data Source
AI summary
A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image.