Focused Ion Beam Multilayer Sample Observation Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing charged particle beam irradiation apparatuses waste time by repeatedly performing the 'cut-and-see' procedure to observe each layer in multilayered samples, as they form unnecessary observation images of non-observation target layers and require excessive time to observe the structure of each observation target layer.
Innovation Solution
A charged particle beam irradiation apparatus with a control unit that performs exposure control using a focused ion beam and observation control using an electron beam in parallel, determining exposure of observation target layers based on design data and error ranges, and forming observation images only when an observation target layer is detected, thereby reducing the number of unnecessary observations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the cut-and-see procedure is repeatedly performed to observe each layer in multilayered samples, then observation images of all layers are obtained, but unnecessary observation images of non-observation target layers are formed, wasting time
Solution Approach 1:
The control unit performs preliminary identification of observation target layers using design data before actual observation. By determining which layers are observation targets in advance and calculating their exposure depths, the system prepares the observation plan beforehand, avoiding unnecessary imaging of non-target layers during the cutting process
Solution Approach 2:
The invention extracts and isolates only the necessary observation target layers from the multilayered sample structure. By identifying specific layers that require observation and excluding non-observation target layers, the system performs only the essential imaging operations needed, removing the waste of time associated with imaging unnecessary layers
2Loss of information
If observation images are formed for all exposed layers, then complete layer information is obtained, but the number of unnecessary observations increases, reducing productivity
Solution Approach 1:
The control unit uses design data to preliminarily determine which layers are observation targets and calculate their exposure depths before the actual observation process. This preliminary identification ensures that only necessary layers are imaged, maintaining information completeness for target layers while improving productivity by avoiding unnecessary imaging of non-target layers
Solution Approach 2:
The control unit continuously monitors the cutting depth and compares it with the calculated exposure depths of observation target layers. This feedback mechanism allows the system to determine precisely when each observation target layer is exposed and trigger imaging only at those specific moments, ensuring complete information capture for target layers while maximizing observation efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time required to observe the substance or structure of each observation target layer in multilayered samples by minimizing unnecessary observations and optimizing the exposure and observation process.
Implementation Method 1
a focused ion beam column configured to irradiate, with a focused ion beam, a multilayered sample... exposure control in which the focused ion beam column is controlled to expose a cross section of the multilayered sample
Implementation Method 2
an electron beam column configured to irradiate the multilayered sample with an electron beam; an electron detector configured to detect one of secondary electrons and reflection electrons generated from the multilayered sample
Data Source
AI summary
The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.