Fuse Element Array Layout for Accurate Blown Resistance Testing

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Solution Overview

Problem

As semiconductor device structures shrink, accurately determining the status of fuse elements becomes challenging due to increased parasitic resistance, leading to inaccurate blown resistance values and test results.

Innovation Solution

The semiconductor device structure incorporates shared active regions and gate structures to form an array of fuse elements, with conductive lines connected to avoid parasitic resistance, enabling accurate testing by reducing the size of the device while maintaining precise status determination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of moving object

If the size of semiconductor device structures is reduced, then the density and integration are improved, but the parasitic resistance increases leading to inaccurate fuse element testing

Engineering Contradiction:
Improvedevice sizeVSAvoidfuse element status determination accuracy
Core Design Contradiction:
Area of moving objectVSMeasurement precision

Solution Approach 1:

The device is segmented into multiple fuse elements arranged in an array, where each fuse element is formed by the overlap of a gate structure and an active region. This segmentation allows independent testing of each fuse element while maintaining a compact overall device structure, resolving the contradiction between small device size and accurate measurement.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Conductive lines are introduced as intermediary elements to directly connect the active regions to the fuse elements, bypassing the transistor channels that would otherwise introduce parasitic resistance. This intermediary connection path eliminates the harmful parasitic resistance while maintaining the reduced device size.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Device complexity

If conventional transistor-based fuse testing is used, then the device structure is simple, but parasitic resistance from transistors causes inaccurate blown resistance values

Engineering Contradiction:
Improvedevice structure simplicityVSAvoidblown resistance measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The harmful parasitic resistance from transistor channels is extracted and removed from the measurement path. Instead of using transistor channels to connect to fuse elements, the invention directly connects active regions to fuse elements through conductive lines, taking out the problematic transistor channel resistance from the critical measurement path.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The gate structures and active regions serve multiple functions: they define the fuse elements, provide direct electrical connections without transistors, and enable accurate resistance measurement. This multi-functionality maintains structural simplicity while eliminating parasitic resistance effects.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS12046310B2Semiconductor device structure
Publication Date: 2024.07.23 NAN YA TECH
  • US12046310B2 patent drawing
  • US12046310B2 patent drawing
  • US12046310B2 patent drawing

AI summary

A semiconductor device structure is provided. The semiconductor device structure includes a first gate structure extending along a first direction and electrically connected to a first transistor, a second gate structure extending along the first direction and electrically connected to a second transistor, a first active region extending along a second direction different from the first direction and across the first gate structure and the second gate structure, and a first conductive element extending along the second direction and disposed on the first active region. The first conductive element is electrically connected to the first active region. The first conductive element is electrically connected to the first active region, such that a short circuit between the first active region and the third transistor is formed. The first gate structure and the first active region form a first fuse element, and the second gate structure and the first active region form a second fuse element.