Using control gates with word lines in flash VMM arrays improves in-memory computing accuracy and speeds weight programming through rerouted erase lines.
Adding carbon, boron, phosphorus, or metal to silicon nitride creates deeper traps that improve charge retention in NAND memory cells.
Asymmetric floating-gate shapes and selective gate spacing equalize coupling ratios, improving threshold voltage uniformity and read reliability.
Columnar memory strings are formed without wet etching, protecting gate insulation layers while lowering contact resistance and supporting denser 3D storage.
A stacked semiconductor and conductive layer structure boosts NOR flash density and capacity while supporting efficient write, read, and erase operations.
Shared active regions and conductive lines cut parasitic resistance, enabling accurate fuse status testing in compact semiconductor layouts.
A serially coupled flash and embedded NVM cell enables single-read multi-state access while avoiding the cost and power penalty of pure embedded memory.
Self-aligned sidewalls and sacrificial lines improve electrical access and lateral alignment in vertically stacked NAND memory arrays.