Gas Intake Device for Magnetron Sputtering Vacuum Chamber
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Solution Overview
Problem
The existing gas ventilation systems in magnetron sputtering vacuum chambers face challenges in achieving uniform gas distribution and mixing, leading to non-uniform film deposition, equipment damage, and reduced service life due to the direct introduction of gases and pressure differences during maintenance.
Innovation Solution
A gas intake device comprising a gas mixing box, a gas intake box, and a connecting pipe with strategically placed gas intake pipes and buffer plates to pre-mix and distribute gases uniformly within the vacuum chamber, reducing impact forces and improving gas mixing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If gas is directly introduced into the vacuum chamber through gas ventilation pipes, then the gas introduction process is simple, but the gas distribution uniformity is poor and equipment damage occurs due to pressure difference impact
Solution Approach 1:
The patent introduces a gas distribution box as an intermediary device between the gas source and the vacuum chamber. This mediator pre-mixes multiple gases uniformly and distributes them through multiple nozzles, transforming the direct gas introduction method into a controlled distribution system that ensures uniform gas concentration throughout the chamber.
Solution Approach 2:
The gas distribution system is segmented into multiple independent nozzles positioned at different locations within the vacuum chamber. Each nozzle introduces gas locally, and the combined effect from multiple segments achieves uniform overall distribution, avoiding the concentration issues of single-point gas introduction.
2Adaptability or versatility
If multiple gas inlets are disposed in the vacuum chamber wall for mixed gas introduction, then gas mixing capability is improved, but the vacuum chamber structure becomes complex and vacuum integrity is compromised
Solution Approach 1:
The gas distribution box serves as an external intermediary that performs all gas mixing operations before gases enter the vacuum chamber. This eliminates the need for multiple gas inlets in the chamber wall, maintaining vacuum integrity while achieving the desired gas mixing capability through the mediator's internal mixing mechanism.
Solution Approach 2:
The gas mixing function is moved from the spatial dimension (multiple inlets in chamber wall) to the temporal dimension (sequential gas introduction and mixing in the distribution box before simultaneous release). This dimensional transformation resolves the contradiction between mixing capability and structural complexity.
3Manufacturing precision
If the bore diameter of gas inlets is increased to improve gas flow, then gas distribution uniformity improves, but the vacuum chamber wall becomes less compact and vacuum integrity deteriorates
Solution Approach 1:
Instead of using a single large-bore inlet that would compromise vacuum integrity, the system segments the gas introduction into multiple smaller nozzles. Each nozzle has a small bore diameter that maintains vacuum integrity, but collectively they provide sufficient gas flow and uniform distribution through their distributed arrangement.
Solution Approach 2:
The solution moves from increasing bore diameter (one-dimensional approach) to increasing the number of nozzles and optimizing their spatial distribution (multi-dimensional approach). This transforms the problem from a single large opening to multiple small openings arranged strategically, achieving both uniform gas distribution and maintained vacuum integrity.
4Adaptability or versatility
If split-flow pipes are disposed in the vacuum chamber for gas distribution, then gas mixing is improved, but the available space for other equipment is reduced
Solution Approach 1:
The gas distribution box acts as an external intermediary that performs all gas mixing and distribution preparation before gases enter the vacuum chamber. This eliminates the need for complex internal split-flow pipe structures, preserving valuable internal chamber space for other equipment while achieving the desired gas mixing effect through the mediator's distribution nozzles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The gas intake device enhances gas distribution uniformity, reduces equipment damage, and prolongs the service life of the apparatus by ensuring uniform gas mixing and reducing impact forces during the film deposition process.
Implementation Method 1
a gas mixing box (1) configured to receive and mix a gas or gases
Implementation Method 2
The gases may be directly introduced into the vacuum chamber by providing several gas ventilation pipes
Implementation Method 3
the impact force to the precision equipment in the vacuum chamber in the film deposition gas intake process by magnetron sputtering can be effectively decreased
Implementation Method 4
a connecting pipe (3) configured to connect with the gas mixing box (1) and the gas intake box (2)
Data Source
AI summary
A gas intake device of magnetron sputtering vacuum chamber and a magnetron sputtering apparatus with the gas intake device, the gas intake device of magnetron sputtering vacuum chamber comprises a gas mixing box configured to receive and mix the gas, a gas intake box configured to introduce the gas into a vacuum chamber, and a connecting pipe configured to connect with the two boxes, the gas mixing box has one or more gas intake pipes. The gas intake device can increase the distribution uniformity after the gas enters inside the vacuum chamber, effectively decrease the impact force to the precision equipment(s) in the vacuum chamber, and extend the service life of the apparatus.