Gate Bus Line Oscillation Suppression via Local Width Reduction
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Solution Overview
Problem
Existing semiconductor devices require epi or chip resistors to suppress loop oscillations of odd mode, which either increase component count or lead to gate leak currents due to large resistor areas, and are ineffective at achieving the necessary low resistance for suppression.
Innovation Solution
A semiconductor device manufacturing method involving a metal layer with a patterned gate bus line having a small width portion to achieve high resistance without the need for epi or chip resistors, using a plated layer and mask layers to accurately control the resistance and pattern the gate bus line.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an epi resistor is electrically coupled between gate pads to suppress loop oscillation, then oscillation suppression is achieved, but the resistor area becomes large causing gate leak current
Solution Approach 1:
The gate bus line width is locally reduced at specific positions between adjacent gate fingers to create high resistance sections. This local geometry change provides the necessary resistance for oscillation suppression without requiring large-area epi resistors, thereby avoiding gate leak current while achieving the same functional effect.
Solution Approach 2:
The resistance of the gate bus line is adjusted by changing its geometric parameters (width and length) rather than using a separate resistor component. By reducing the width and increasing the length of specific gate bus line sections, the resistance is increased to provide oscillation suppression without the harmful effects of epi resistors.
2Reliability
If a chip resistor is electrically coupled between gate pads to suppress loop oscillation, then oscillation suppression is achieved, but the component count increases
Solution Approach 1:
The oscillation suppression function is merged into the gate bus line structure itself by creating high resistance sections through width reduction. This integrates the suppression function into the existing interconnect structure, eliminating the need for separate chip resistor components and reducing overall device complexity.
Solution Approach 2:
The gate bus line serves multiple functions: it provides electrical connection between gate fingers and simultaneously provides oscillation suppression through its high resistance sections. This multi-functionality eliminates the need for dedicated suppression components, reducing component count while maintaining the suppression effect.
3Reliability
If an epi resistor is used to suppress loop oscillation, then oscillation suppression is achieved, but the resistance is insufficient for effective suppression
Solution Approach 1:
The gate bus line width is locally reduced at specific positions between adjacent gate fingers to create high resistance sections. This local geometry change provides the necessary resistance for oscillation suppression without requiring large-area epi resistors, thereby avoiding gate leak current while achieving the same functional effect.
Solution Approach 2:
The resistance of the gate bus line is adjusted by changing its geometric parameters (width and length) rather than using a separate resistor component. By reducing the width and increasing the length of specific gate bus line sections, the resistance is increased to provide oscillation suppression without the harmful effects of epi resistors.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively suppresses loop oscillations of odd mode without increasing component count or causing gate leak currents, maintaining gain characteristic and phase balance while reducing capacitance and component complexity.
Implementation Method 1
forming a plated layer having a pattern corresponding to a pattern of a gate bus line which couples each gate finger of a plurality of FETs on the metal layer
Data Source
AI summary
A method for manufacturing a semiconductor device includes: forming a metal layer on a semiconductor layer; forming a plated layer having a pattern corresponding to a pattern of a gate bus line which couples each gate finger of a plurality of FETs on the metal layer, the pattern corresponding to the pattern of the gate bus line having a deficient part; forming a mask layer which covers the metal layer exposed in the deficient part; and patterning the metal layer by using the plated layer and the mask layer as a mask.


