Glass Etching Composition for Uniform Ultra-Thin Glass Treatment
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Solution Overview
Problem
Existing ultra-thin glass (UTG) used in foldable and rollable displays faces challenges with low light transmittance, mechanical vulnerability, and non-uniform etching, leading to high production costs and reduced yield.
Innovation Solution
A composition comprising fluorosilicic acid (H2SiF6) and hydrofluoric acid (HF) with a specific silicon ratio (Sihydro/Sitotal ≥ 0.8) is used for surface treatment, enhancing etching speed and uniformity, and includes a buffer mechanism to maintain hydrofluoric acid concentration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If ultra-thin glass is used to achieve high light transmittance and flexibility, then light transmittance and formability are improved, but mechanical strength deteriorates causing breakage during processing
Solution Approach 1:
The patent applies preliminary surface treatment to ultra-thin glass before final processing or assembly. By pre-treating the surface with chemical etching or plasma treatment, the glass gains improved surface properties and reduced internal stresses that would otherwise cause breakage during subsequent handling and processing operations
Solution Approach 2:
The patent modifies surface parameters of ultra-thin glass through controlled chemical etching processes that alter surface composition and structure. This creates a surface layer with different mechanical properties than the bulk material, providing enhanced strength and damage resistance while preserving the thin, flexible, and transparent nature of the glass
2Device complexity
If conventional etching compositions are used on ultra-thin glass, then etching process is simple, but etching uniformity deteriorates leading to non-uniform surface treatment
Solution Approach 1:
The patent modifies the chemical composition parameters of the etching solution by adding specific additives and adjusting concentration ratios. This creates a controlled etching environment that removes material at a uniform rate across the ultra-thin glass surface, preventing localized variations in etching depth and surface quality
Solution Approach 2:
The patent introduces intermediary substances into the etching composition that act as mediators between the etching agents and the glass surface. These intermediaries regulate the etching reaction rate and distribution, ensuring uniform material removal while maintaining process simplicity
3Productivity
If etching speed is increased to improve productivity, then production efficiency is improved, but etching uniformity deteriorates causing surface defects
Solution Approach 1:
The patent optimizes multiple parameters of the etching composition simultaneously, including the concentration ratios of different chemical components, temperature, and pH levels. This creates a balanced chemical environment that enables fast etching rates while maintaining uniform reaction across the entire glass surface, preventing defects such as pitting or non-uniform thickness
Solution Approach 2:
The patent uses a composite etching composition containing multiple chemical agents that work synergistically. Different components of the composite solution perform different functions: some provide high etching speed, others ensure uniform distribution, and some prevent surface defects. This composite approach achieves both high productivity and high precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves faster and more uniform etching of glass substrates, improving mechanical strength and reducing production costs by maintaining etch rate consistency and minimizing defects.
Implementation Method 1
contacting the composition with a glass substrate in etching the glass
Data Source
AI summary
A composition for surface treatment includes fluorosilicic acid (H2SiF6) and hydrofluoric acid (HF), and/or a surface treatment method using the same. The composition may be used to treat (e.g., etch) a substrate such as glass or the like.