Gradient Diffuser Structure for Uniform Deposition Chamber Gas Flow

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Solution Overview

Problem

Existing deposition chamber systems face challenges with non-uniform gas flow into process chambers, leading to uneven film deposition on substrates, particularly in large-area flat panel displays where edges and corners experience different processing conditions.

Innovation Solution

The development of a diffuser with a unique design featuring a back-side gradient surface and a front-side gradient surface, along with a plurality of opening structures including conical and cylindrical openings, arranged in specific patterns to enhance gas flow distribution and plasma density uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional gas flow distribution is used in deposition chambers, then the system structure is simple, but the gas flow is non-uniform causing non-uniform film deposition

Engineering Contradiction:

Improvefilm uniformityVSAvoiddiffuser structure

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The diffuser block incorporates different surface geometries (concave front-side gradient surface and convex back-side gradient surface) and varying opening structures (cylindrical, conical, or combinations) at different locations to create locally optimized gas flow characteristics. This local differentiation enables uniform gas distribution across the substrate surface, directly addressing the film uniformity requirement while managing structural complexity through targeted design variations.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The diffuser is divided into multiple functional zones with different opening structures arranged in specific patterns. The opening structures may include cylindrical openings, conical openings, or combinations, with varying densities and configurations across the diffuser surface. This segmentation allows independent optimization of gas flow in different regions to achieve overall uniformity.

Inventive Principle:

Principle #1Segmentation

2Use of energy by moving object

If conventional diffuser design is used, then manufacturing is simpler, but power efficiency is lower and edge exclusion occurs

Engineering Contradiction:

Improvepower efficiencyVSAvoiddiffuser fabrication

Core Design Contradiction:

Use of energy by moving objectVSEase of manufacture

Solution Approach 1:

The diffuser design modifies critical parameters including opening density (0.8 to 1.25 holes per square centimeter), opening geometries (cylindrical, conical, or combined), and surface profiles (concave front-side gradient and convex back-side gradient). These parameter changes optimize plasma density distribution and power efficiency while minimizing edge exclusion effects in large-area substrates.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS20250046578A1Deposition chamber system diffuser with increased power efficiency

Publication Date: 2025.02.06 APPLIED MATERIALS INC

AI summary

A method can include removing material from a first side of a diffuser block to form a back-side gradient surface of a diffuser, wherein the back-side gradient surface is a first concave surface, after removing the material from the first side, removing material from a second side of the diffuser block to form a front-side gradient surface of the diffuser, wherein the front-side gradient surface is a second concave surface, and forming a plurality of opening structures through the front-side gradient surface to the back-side gradient surface.