Gradient TiN Electrode MRAM for Data Retention and Power

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Solution Overview

Problem

Current magnetoresistive random access memory (MRAM) devices face issues such as high chip area, high cost, high power consumption, and sensitivity to temperature variations, limiting their performance and efficiency.

Innovation Solution

A method for fabricating MRAM devices involves forming a magnetic tunneling junction (MTJ) stack with a first top electrode having a gradient concentration of nitrogen to titanium ratio and a second top electrode with a non-gradient concentration, both made of TiN, to improve tunnel magnetoresistance and device performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional MRAM devices are used, then data retention is achieved, but chip area becomes large and power consumption increases

Engineering Contradiction:
Improvedata retentionVSAvoidchip area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The patent applies local quality by creating a gradient concentration profile in the TiN top electrode, where the nitrogen-to-titanium ratio varies continuously from the interface with the MTJ stack toward the surface. This local variation in material composition optimizes the electrode's magnetic and electrical properties at different depths, enabling smaller device footprint while maintaining data retention capability through enhanced tunnel magnetoresistance effects.

Inventive Principle:
Principle #3Local quality

2Reliability

If conventional MRAM devices are used, then data retention is achieved, but power consumption becomes high

Engineering Contradiction:
Improvedata retentionVSAvoidpower consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent employs parameter changes by systematically varying the nitrogen-to-titanium concentration ratio within the TiN top electrode layer. This parameter variation creates an optimized gradient profile that enhances tunnel magnetoresistance, allowing the device to maintain data retention with reduced write current requirements, thereby lowering power consumption while preserving non-volatile memory functionality.

Inventive Principle:
Principle #35Parameter changes

3Adaptability or versatility

If conventional MRAM devices are used, then basic functionality is achieved, but sensitivity to temperature variation increases

Engineering Contradiction:
Improvebasic functionalityVSAvoidtemperature variation sensitivity
Core Design Contradiction:
Adaptability or versatilityVSObject-affected harmful factors

Solution Approach 1:

The patent addresses temperature sensitivity through local quality by implementing a gradient concentration profile in the TiN top electrode. This spatial variation in material composition allows different regions of the electrode to have optimized properties for thermal stability, reducing the device's sensitivity to temperature fluctuations while maintaining core MRAM functionality.

Inventive Principle:
Principle #3Local quality

4Reliability

If gradient concentration top electrode is used, then tunnel magnetoresistance is improved, but manufacturing complexity increases

Engineering Contradiction:
Improvetunnel magnetoresistanceVSAvoidmanufacturing complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent manages manufacturing complexity while achieving improved tunnel magnetoresistance by using parameter changes in the form of a controlled gradient concentration profile. The continuous variation in nitrogen-to-titanium ratio is implemented through advanced deposition techniques that can precisely control compositional gradients, balancing the performance benefits with acceptable manufacturing complexity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the performance of MRAM devices by optimizing the nitrogen to titanium ratio in the electrodes, leading to improved tunnel magnetoresistance and reduced sensitivity to temperature variations, thereby addressing the limitations of existing MRAM technologies.

Implementation Method 1

Magnetoresistance (MR) effect has been known as a kind of effect caused by altering the resistance of a material through variation of outside magnetic field

Methodology Applied
Scientific EffectMagnetoresistance: Magnetoresistance

Implementation Method 2

magnetic tunneling junction (MTJ) stack comprising a pinned layer, a barrier layer, and a free layer

Methodology Applied
Scientific EffectQuantum tunneling:

Data Source

PatentUS20240397832A1Magnetic random access memory device and method for fabricating the same
Publication Date: 2024.11.28 UNITED MICROELECTRONICS CORP
  • US20240397832A1 patent drawing
  • US20240397832A1 patent drawing
  • US20240397832A1 patent drawing

AI summary

A magnetic random access memory (MRAM) device includes a magnetic tunneling junction (MTJ) on a substrate, a first top electrode on the MTJ, a second top electrode on and directly contacting the first top electrode, and a spacer adjacent to the MTJ. Preferably, the first top electrode includes a gradient concentration while the second top electrode includes a non-gradient concentration.