Gray-tone Photolithography for X-Ray Sensor Manufacturing
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Solution Overview
Problem
The conventional manufacturing method for X-Ray sensors requires a large number of mask exposure processes, leading to high costs, low yield, and reduced productivity due to the complexity and expense of mask plates.
Innovation Solution
A manufacturing method using a gray-tone photolithography process to reduce the number of mask plates required, from 11 to 5, by sequentially preparing gate scanning lines, depositing thin films, and processing layers to form switch devices and photoelectric sensing devices, with specific steps involving gate insulation, active layers, ohmic contact layers, and passivation layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography process with multiple mask plates is used, then manufacturing precision can be maintained, but device complexity and manufacturing cost increase significantly
Solution Approach 1:
The patent combines multiple mask exposure processes into a single gray-tone photolithography process. By using gray-tone photoresist that responds to different exposure doses, the method integrates what would traditionally require 11 separate mask plates into just one mask plate, thereby reducing device complexity while maintaining manufacturing precision through controlled exposure dosing.
Solution Approach 2:
The patent changes the parameter of photoresist from conventional binary (exposed/not exposed) to gray-tone (variable exposure dose). This parameter change allows a single mask plate to define multiple patterns with different exposure doses, eliminating the need for multiple mask plates and reducing process complexity while maintaining precise pattern formation.
2Manufacturing precision
If conventional photolithography process with multiple mask plates is used, then pattern formation can be achieved, but productivity decreases due to excessive processing steps
Solution Approach 1:
The patent merges 11 sequential mask exposure steps into a single gray-tone photolithography step. This consolidation dramatically reduces equipment productivity loss by eliminating repeated mask plate changes, photoresist coating, and development cycles, while still achieving the required pattern formation capability through variable dose exposure.
Solution Approach 2:
The patent performs preliminary action by using a single mask plate design that encodes all necessary pattern information through varying exposure dose requirements. The gray-tone photoresist is prepared in advance to respond to different dose levels, allowing all patterns to be formed in one exposure step rather than requiring sequential processing.
3Manufacturing precision
If conventional photolithography process with multiple mask plates is used, then manufacturing can be completed, but product cost increases due to high mask plate cost
Solution Approach 1:
The patent merges the functionality of 11 expensive mask plates into a single mask plate used with gray-tone photolithography. This eliminates the need to purchase, store, and handle multiple high-precision mask plates, dramatically reducing manufacturing cost while maintaining pattern definition accuracy through controlled exposure dosing.
Solution Approach 2:
The patent replaces expensive, reusable mask plates with a process that uses a single mask plate in conjunction with gray-tone photoresist. The photoresist acts as a disposable medium that captures all pattern information in one exposure, eliminating the recurring cost of multiple mask plates while maintaining manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach decreases product costs, enhances yield, and improves equipment productivity by simplifying the processing steps and reducing the number of mask plates needed, thereby minimizing damage and failure rates.
Implementation Method 1
processing a lamination structure of the active layer thin film, the ohmic contact layer thin film, the first conducting layer thin film and the photoelectric conversion layer thin film using a gray-tone photolithography process
Data Source
AI summary
An embodiment of the invention discloses a manufacture method of a sensor comprising: preparing gate scanning lines on a substrate; depositing a gate insulating layer on the gate scanning lines; sequentially depositing a gate insulation thin film, an active layer thin film, an ohmic contact layer thin film, a first conducting layer thin film and a photoelectric conversion layer thin film, and after the depositing, processing a lamination structure of the thin films with a gray-tone mask plate to obtain switch devices and photoelectric sensing devices; and then sequentially preparing a first passivation layer, bias lines and a second passivation layer.