Grinding Tool Coolant Flow Control for Semiconductor Wafer Processing

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Solution Overview

Problem

Existing grinding technologies face challenges in maintaining constant grinding conditions and extending the service life of grinding tools due to non-constant surface damage and inadequate cooling, particularly with varying grinding tool wear.

Innovation Solution

The method adjusts the coolant flow rate based on the grinding tooth height of the tool, reducing it as the tooth height decreases, ensuring constant cooling and preventing aquaplaning, while maintaining a minimum flow rate to prevent premature tool replacement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Duration of action of stationary object

If a constant coolant flow rate is used during grinding, then cooling is maintained, but the service life of the grinding tool is reduced due to inadequate cooling as tooth height decreases

Engineering Contradiction:
Improveservice life of grinding toolVSAvoidcooling effectiveness
Core Design Contradiction:
Duration of action of stationary objectVSTemperature

Solution Approach 1:

The coolant flow rate is made dynamic rather than constant, being automatically adjusted based on the grinding tooth height. As the tooth height decreases due to wear, the system reduces the coolant flow rate proportionally, optimizing cooling effectiveness throughout the tool's service life and preventing premature replacement.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system incorporates feedback control where the actual grinding tooth height is measured and used to regulate the coolant flow rate. This closed-loop control ensures that cooling is always appropriate to the current tool condition, extending service life while maintaining effective cooling.

Inventive Principle:
Principle #23Feedback

2Duration of action of stationary object

If the coolant flow rate is reduced as grinding tooth height decreases, then cooling is optimized for tool wear, but aquaplaning may occur at very low flow rates

Engineering Contradiction:
Improveservice life of grinding toolVSAvoidgrinding process stability
Core Design Contradiction:
Duration of action of stationary objectVSReliability

Solution Approach 1:

The system changes the coolant flow rate parameter dynamically based on grinding tooth height, reducing it as the tool wears. This parameter adjustment optimizes cooling efficiency throughout the tool's life while maintaining sufficient flow to prevent aquaplaning, balancing tool longevity with process stability.

Inventive Principle:
Principle #35Parameter changes

3Temperature

If a high coolant flow rate is used throughout the grinding process, then cooling is effective, but material is removed too quickly reducing productivity

Engineering Contradiction:
Improvecooling effectivenessVSAvoidmaterial removal rate
Core Design Contradiction:
TemperatureVSProductivity

Solution Approach 1:

The coolant flow rate is dynamically adjusted to match the grinding tooth height, which correlates with material removal capacity. As the tool wears and removes less material, the system proportionally reduces coolant flow, preventing excessive cooling that would reduce productivity while maintaining effective cooling when the tool is fresh.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach achieves consistent surface damage and extends the service life of grinding tools by optimizing coolant delivery in relation to tool wear, preventing aquaplaning and ensuring effective cooling throughout the grinding process.

Implementation Method 1

a supply of coolant is delivered into a contact region between a semiconductor wafer and the at least one grinding tool

Methodology Applied
Scientific EffectConvection: Convection

Implementation Method 2

guided substantially free from constraining forces axially between a water cushion (hydrostatic principle) or air cushion (aerostatic principle) acting on the front and back sides

Methodology Applied
Scientific EffectHydrostatic pressure: Pressure Increase

Implementation Method 3

guided substantially free from constraining forces axially between a water cushion (hydrostatic principle) or air cushion (aerostatic principle) acting on the front and back sides

Methodology Applied
Scientific EffectAerostatic pressure: Pressure Increase

Implementation Method 4

mechanical processing steps which remove material. Edge rounding is carried out by grinding or polishing

Methodology Applied
Scientific EffectAbrasion: Abrasion

Data Source

PatentUS7666064B2Method for grinding semiconductor wafers
Publication Date: 2010.02.23 SILTRONIC AG

AI summary

Semiconductor wafers are processed so as to remove material on one or both sides by means of at least one grinding tool, with coolant supplied into a contact region between the semiconductor wafer and the at least one grinding tool, characterized in that the coolant flow rate is set as a function of a grinding tooth height of the at least one grinding tool and this coolant flow rate is reduced as the grinding tooth height decreases.