Hand Cleaning Unit for Substrate Conveyance Mechanism
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Solution Overview
Problem
Existing substrate processing apparatuses do not effectively clean the conveyance mechanism, which can lead to defects in substrates due to foreign materials accumulating on the hands and claws used for handling, affecting the cleanliness and quality of the polishing process.
Innovation Solution
Incorporating a hand cleaning unit with a hand cleaning tank and a cleaning liquid injection mechanism within the substrate processing apparatus to specifically clean the hands and claws, ensuring they are free from foreign materials before and during substrate handling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the substrate is cleaned by the cleaning module, then the substrate cleanliness is improved, but the conveyance mechanism (hand) accumulates foreign materials affecting subsequent cleaning operations
Solution Approach 1:
The hand cleaning unit performs cleaning of the conveyance mechanism before the hand contacts the substrate again. The hand is housed in the hand cleaning tank and cleaned by injection of cleaning liquid, preventing foreign material accumulation that would affect subsequent substrate handling operations
Solution Approach 2:
The hand cleaning tank serves as an intermediary cleaning station between substrate processing operations. The cleaning liquid acts as a mediator to remove foreign materials from the hand without requiring disassembly or complex cleaning mechanisms
2Reliability
If the hand cleaning unit is added to clean the conveyance mechanism, then the overall cleanliness is improved, but the device complexity increases
Solution Approach 1:
The cleaning system is segmented into separate functional units: the hand cleaning tank as a distinct module from the substrate cleaning module. This allows independent operation and maintenance of the hand cleaning function without affecting the main substrate processing system
Solution Approach 2:
The hand cleaning unit operates autonomously using an injection mechanism that delivers cleaning liquid to the hand housed in the tank. The system self-regulates the cleaning process without requiring manual intervention or complex control systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the cleanliness of the conveyance mechanism, reducing the risk of defects on substrates by regularly cleaning the hands and claws, thereby improving the overall polishing and cleaning process efficiency and quality.
Implementation Method 1
a cleaning liquid injection mechanism configured to inject a cleaning liquid toward a predetermined position when the hand is housed in the hand cleaning tank
Data Source
AI summary
A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.