Hexafluoropropene Composition Stabilized for Storage and Transport
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Solution Overview
Problem
Existing hexafluoropropene compositions face issues with decomposition and purity loss during storage and transportation, particularly under harsh conditions such as temperature increases during marine transportation.
Innovation Solution
A hexafluoropropene-containing composition comprising hexafluoropropene, its dimer and/or trimer, and controlled amounts of oxygen, hydrogen fluoride, or hydrogen chloride, with specific concentration ranges to stabilize the composition and suppress decomposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If hexafluoropropene is stored and transported under harsh conditions (temperature increase), then transportation efficiency is improved, but decomposition of HFP or HFP-derived dimer and/or trimer occurs and purity decreases
Solution Approach 1:
The patent introduces oxygen, hydrogen fluoride, or hydrogen chloride as intermediary substances to prevent the decomposition reaction between HFP and HFP-derived dimers/trimers. These intermediaries act as stabilizing agents that suppress harmful chemical reactions during storage and transportation, enabling safe transport under various temperature conditions including harsh environments.
2Manufacturing precision
If the composition is purified to high purity, then etching performance is improved, but the composition becomes more sensitive to decomposition during storage
Solution Approach 1:
The patent applies intermediary substances (oxygen, hydrogen fluoride, or hydrogen chloride) specifically to high-purity HFP compositions (95 vol% or more) to prevent decomposition. These intermediaries stabilize the highly purified composition by suppressing decomposition reactions, thereby maintaining both the high etching performance required for semiconductor manufacturing and the storage stability needed for practical handling.
3Reliability
If dimer and/or trimer content is increased to improve storage stability, then decomposition is suppressed, but etching performance may be compromised
Solution Approach 1:
The patent optimizes the concentration parameters of stabilizing components (oxygen: 0.05-10 ppm, hydrogen fluoride: 0.05-5 ppm, or hydrogen chloride: 0.05-5 ppm) to achieve the right balance between storage stability and etching performance. By precisely controlling these parameter ranges, the composition maintains high etching performance while suppressing decomposition during storage, avoiding the need to increase dimer/trimer content excessively.
Data Source
AI summary
The present disclosure aims to provide a novel hexafluoropropene-containing composition. A hexafluoropropene-containing composition is provided.