Hexagonal Cell Array Drop Pattern Generation for Nanoimprint Lithography

The patent segments the continuous fill area into a discrete array of hexagonal cells, each with predetermined volume associations. This segmentation enables precise control over material distribution by treating each cell as an independent unit that can be individually assigned to drops, thereby improving deposition uniformity while managing complexity through systematic discretization.

The patent applies local quality by assigning different properties to different regions through the hexagonal cell array. Each cell has specific volume characteristics and can be selectively assigned to drops based on local requirements. The recursive distribution algorithm ensures that each location receives the appropriate amount of material based on its specific needs, achieving uniform deposition across varying local conditions.

The patent applies preliminary action by pre-defining the hexagonal cell array structure and associating predetermined volumes with each cell before the actual drop assignment process. The scanning sequence and fill set assignments are prepared in advance, which streamlines the recursive distribution process and reduces computational complexity during execution while maintaining high pattern accuracy.

The patent employs dynamics through the recursive distribution algorithm that adaptively assigns cells to drops based on remaining volume requirements. The algorithm dynamically adjusts the assignment process by scanning through the array, identifying unassigned cells, and recursively distributing material until the predetermined volume is achieved, allowing flexible adaptation to varying pattern requirements.